900755

SLAP TA

95%

• Sinônimo(s): 3-(((Trimethylsilyl)methyl)thio)propan-1-amine
• Fórmula empírica (Notação de Hill): C₇H₁₉NSSi
• Número CAS: 2093935-86-3
• Peso molecular: 177.38
• Número MDL: MFCD31560650
• Código UNSPSC: 12352103
• NACRES: NA.22

Propriedades

• Nível de qualidade: 100
• Ensaio: 95%
• Formulário: liquid
• densidade: 0.90452
• grupo funcional: amine; thioether
• temperatura de armazenamento: 2-8°C
• cadeia de caracteres SMILES: [Si](CSCCCN)(C)(C)C
• InChI: 1S/C7H19NSSi/c1-10(2,3)7-9-6-4-5-8/h4-8H2,1-3H3
• chave InChI: CNESDLLESCAVSR-UHFFFAOYSA-N

Descrição

Aplicação

When used with aliphatic or aromatic aldehydes, this silicon amine protocol SLAP reagent enables the photomediated synthesis of thiomorpholines and thiazepanes. For photocatalytic cross-coupling with this SLAP Reagent, Ir[(ppy)₂dtbbpy]PF₆ (747769) is used with a recommended starting combination of Lewis acids Bi(OTf)₃ (633305) and Cu(OTf)₂ (283673) prior to subsequent substrate-specific optimization. This product was introduced in collaboration with the Bode Research Group and provides a tin-free alternative to SnAP (tin amine protocol) reagents and is well-suited for scale-up reactions.

Outras notas

• Technology Spotlight: SLAP Reagents for Piperazine Synthesis
• Silicon Amine Reagents for the Photocatalytic Synthesis of Piperazines from Aldehydes and Ketones
• Lewis Acid Induced Toggle from Ir(II) to Ir(IV) Pathways in Photocatalytic Reactions: Synthesis of Thiomorpholines and Thiazepanes from Aldehydes and SLAP Reagents.
• Continuous Flow Synthesis of Morpholines and Oxazepanes with Silicon Amine Protocol (SLAP) Reagents and Lewis Acid Facilitated Photoredox Catalysis

Informações de segurança

• Pictogramas: GHS02
• Palavra indicadora: Warning
• Frases de perigo: H226
• Declarações de precaução: P210 - P370 + P378
• Classificações de perigo: Flam. Liq. 3
• Código de classe de armazenamento: 3 - Flammable liquids
• Classe de risco de água (WGK): WGK 3
• Ponto de fulgor (°F): 75.0 °F
• Ponto de fulgor (°C): 23.89 °C