679267
deposition grade
≥98%
liquid
n20/D 1.405 (lit.)
146-148 °C (lit.)
0.963 g/mL at 25 °C (lit.)
CO[Si](CC=C)(OC)OC
1S/C6H14O3Si/c1-5-6-10(7-2,8-3)9-4/h5H,1,6H2,2-4H3
LFRDHGNFBLIJIY-UHFFFAOYSA-N
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This Item | 446955 | 679364 | 679291 |
---|---|---|---|
assay ≥98% | assay 95% | assay ≥98% | assay ≥98% |
form liquid | form liquid | form solution | form liquid |
refractive index n20/D 1.405 (lit.) | refractive index n20/D 1.405 (lit.) | refractive index n20/D 1.396 (lit.) | refractive index n20/D 1.461 (lit.) |
bp 146-148 °C (lit.) | bp 146-148 °C (lit.) | bp 137 °C, 154 °C (lit.) | bp 112-113 °C/10 mmHg (lit.) |
density 0.963 g/mL at 25 °C (lit.) | density 0.963 g/mL at 25 °C (lit.) | density 0.93 g/mL at 25 °C (lit.) | density 0.996 g/mL at 25 °C (lit.) |
Warning
Eye Irrit. 2 - Flam. Liq. 3 - Skin Irrit. 2 - STOT SE 3
Respiratory system
3 - Flammable liquids
WGK 3
114.8 °F - closed cup
46 °C - closed cup
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Deposition Grade Silanes, fully characterized by chemical analysis and nuclear magnetic resonance (NMR) with greater than 98% purity, for Sol-Gel Processes.
Research involving reactive silicone chemistry has focused on the production of pure silicon and hybrid materials, hydrosilylation, ring-opening and atom transfer polymerizations, polymerizations with controlled stereochemistry, and condensation reactions.
Mesoporous Oxides and Their Applications to Hydrogen Storage
atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer
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