Solution deposition and vapor deposition are two synthesis routes used for formation of advanced, precision thin films and coatings. Solution deposition, also known as sol-gel processing, can be utilized to prepare a wide range of inorganic and hybrid composite materials from a solution of precursors. By generating colloidal suspensions knowns as “sols”, they can be converted to a gel, and subsequently to a solid. Vapor deposition encompasses a host of techniques by which precursors or target materials are converted and employed in the gas phase to form engineered films on substrates. Our compendium of products for deposition techniques allows for precise tailoring of thin film and coating properties. Select from our broad array of dependable and quality film deposition precursors according to your chosen method and application.
We offer a broad array of dedicated solution deposition precursors with 55 different base metals in acetate, acetylacetonate, tert-butoxide, isopropoxide, phenoxide, ethoxide, tri-sec-butoxide, methoxide, 2-ethylhexanoate, among other functionalities. These products are offered in various purities from 90% to 99.999%, assorted concentrations in select solvents, and specific hydrated forms to enable your distinct chemistry.
We provider high-quality volatile organometallic precursors, metal precursors, and metalorganic precursors for CVD/ALD. For convenience and safety, these precursors are prepackaged in steel cylinders for use with an assortment of deposition systems.
Physical vapor deposition (PVD) utilizes vaporized material from a solid source material to deposit thin films on a substrate. We offer high-purity sputtering targets, pellets, metal foils and evaporation slugs for use in various PVD applications, including microelectronic devices, battery electrodes, diffusion barriers, and optical coatings.
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