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553468

Sigma-Aldrich

Tris(tert-butoxy)silanol

99.999%

Sinônimo(s):

TBS

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About This Item

Fórmula linear:
((CH3)3CO)3SiOH
Número CAS:
18166-43-3
Peso molecular:
264.43
Número MDL:
MFCD00271024
Código UNSPSC:
12352103
ID de substância PubChem:
24879332
NACRES:
NA.23

Nível de qualidade

100

Ensaio

99.999%

forma

solid

pb

205-210 °C (lit.)

pf

63-65 °C (lit.)

cadeia de caracteres SMILES

CC(C)(C)O[Si](O)(OC(C)(C)C)OC(C)(C)C

InChI

1S/C12H28O4Si/c1-10(2,3)14-17(13,15-11(4,5)6)16-12(7,8)9/h13H,1-9H3

chave InChI

HLDBBQREZCVBMA-UHFFFAOYSA-N

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Descrição geral

Tris(tert-butoxy)silanol can react with various metal alkyl amides to act as precursors for vapor deposition metal silicates. It also acts as a suitable precursor for deposition of silica.

Aplicação

Tris(tert-alkoxy)silanols reacts with tetrakis(dimethylamino)-hafnium vapor(Hf(N(CH3)2)4) for vapor phase deposition of hafnium silicate glass films. Tris(tert-butoxy)silanol is used for atomic layer deposition (ALD) of highly conformal layers of amorphous silicon dioxide and aluminum oxide nanolaminates.

Código de classe de armazenamento

11 - Combustible Solids

Classe de risco de água (WGK)

WGK 3

Ponto de fulgor (°F)

Not applicable

Ponto de fulgor (°C)

Not applicable

Equipamento de proteção individual

Eyeshields, Gloves, type N95 (US)

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Certificados de análise (COA)

Lot/Batch Number
SHBL5061
SHBL0342
SHBK7740
SHBK3444
SHBK3445

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Rapid vapor deposition of highly conformal silica nanolaminates.
Hausmann D, et al.
Science, 298(5592), 402-406 null
Rapid SiO2 Atomic Layer Deposition Using Tris(tert-pentoxy)silanol.
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