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759562

Sigma-Aldrich

Tris(dimethylamino)silane

packaged for use in deposition systems

Synonym(s):
Tris(dimethylamino)silane, (Me2N)3SiH, N,N,N′,N′,N′′, N′′-Hexamethylsilanetriamine, TDMAS, Tris(dimethylamido)silane, N,N,N′,N′,N′′,N′′-Hexamethylsilanetriamine
Linear Formula:
((CH3)2N)3SiH
CAS Number:
Molecular Weight:
161.32
EC Number:
MDL number:
PubChem Substance ID:
NACRES:
NA.23

Quality Level

assay

≥99.9% (GC)

form

liquid

bp

142 °C (lit.)

mp

−90 °C (lit.)

density

0.838 g/mL at 25 °C (lit.)

SMILES string

CN(C)[SiH](N(C)C)N(C)C

InChI

1S/C6H19N3Si/c1-7(2)10(8(3)4)9(5)6/h10H,1-6H3

InChI key

TWVSWDVJBJKDAA-UHFFFAOYSA-N

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Packaging

25 g in stainless steel cylinder

Application

Tris(dimethylamino)silane (TDMAS) is used as an organosilicon source for the deposition of Si oxynitride; carbonitride; nitride and oxide thin films. It is also used to form multicomponent silicon containing thin films. The depositions can be carried out at low substrate temperatures (<150). The melting point and vapor pressure of TDMAS is in a suitable working range; thus making it a very good vapor deposition precursor.

Signal Word

Danger

Hazard Classifications

Acute Tox. 1 Inhalation - Acute Tox. 3 Dermal - Acute Tox. 4 Oral - Eye Dam. 1 - Flam. Liq. 2 - Skin Corr. 1B - Water-react. 2

Supplementary Hazards

Storage Class Code

4.3 - Hazardous materials, which set free flammable gases upon contact with water

WGK

WGK 3

Flash Point(F)

16.0 - 32.0 °F - closed cup

Flash Point(C)

-8.89 - 0,00 °C - closed cup

Certificate of Analysis

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Certificate of Origin

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