コンテンツへスキップ
Merck
  • Shape evolution and single particle luminescence of organometal halide perovskite nanocrystals.

Shape evolution and single particle luminescence of organometal halide perovskite nanocrystals.

ACS nano (2015-02-11)
Feng Zhu, Long Men, Yijun Guo, Qiaochu Zhu, Ujjal Bhattacharjee, Peter M Goodwin, Jacob W Petrich, Emily A Smith, Javier Vela
要旨

Organometallic halide perovskites CH3NH3PbX3 (X = I, Br, Cl) have quickly become one of the most promising semiconductors for solar cells, with photovoltaics made of these materials reaching power conversion efficiencies of near 20%. Improving our ability to harness the full potential of organometal halide perovskites will require more controllable syntheses that permit a detailed understanding of their fundamental chemistry and photophysics. In this manuscript, we systematically synthesize CH3NH3PbX3 (X = I, Br) nanocrystals with different morphologies (dots, rods, plates or sheets) by using different solvents and capping ligands. CH3NH3PbX3 nanowires and nanorods capped with octylammonium halides show relatively higher photoluminescence (PL) quantum yields and long PL lifetimes. CH3NH3PbI3 nanowires monitored at the single particle level show shape-correlated PL emission across whole particles, with little photobleaching observed and very few off periods. This work highlights the potential of low-dimensional organometal halide perovskite semiconductors in constructing new porous and nanostructured solar cell architectures, as well as in applying these materials to other fields such as light-emitting devices and single particle imaging and tracking.

材料
製品番号
ブランド
製品内容

Sigma-Aldrich
アセトニトリル, suitable for HPLC, gradient grade, ≥99.9%
Sigma-Aldrich
エチルアルコール(純粋), 200 proof, for molecular biology
Sigma-Aldrich
アセトン, ACS reagent, ≥99.5%
Sigma-Aldrich
テトラヒドロフラン, inhibitor-free, suitable for HPLC, ≥99.9%
Sigma-Aldrich
アセトン, suitable for HPLC, ≥99.9%
Sigma-Aldrich
N,N-ジメチルホルムアミド, ACS reagent, ≥99.8%
Sigma-Aldrich
N,N-ジメチルホルムアミド, suitable for HPLC, ≥99.9%
Sigma-Aldrich
アセトン, HPLC Plus, for HPLC, GC, and residue analysis, ≥99.9%
Sigma-Aldrich
テトラヒドロフラン, contains 250 ppm BHT as inhibitor, ACS reagent, ≥99.0%
Sigma-Aldrich
トルエン, ACS reagent, ≥99.5%
Sigma-Aldrich
トルエン, suitable for HPLC, 99.9%
Sigma-Aldrich
トルエン, HPLC Plus, for HPLC, GC, and residue analysis, ≥99.9%
Sigma-Aldrich
アセトン, Laboratory Reagent, ≥99.5%
Sigma-Aldrich
ヨウ化水素酸, 57 wt. % in H2O, distilled, stabilized, 99.95%
Sigma-Aldrich
アセトニトリル, ACS reagent, ≥99.5%
Sigma-Aldrich
アセトニトリル, for HPLC, for UV, ≥99.9% (GC)
Sigma-Aldrich
アセトニトリル, suitable for HPLC, gradient grade, ≥99.9%
Sigma-Aldrich
オレイン酸, technical grade, 90%
Sigma-Aldrich
臭化水素酸, ACS reagent, 48%
Sigma-Aldrich
N,N-ジメチルホルムアミド, puriss. p.a., ACS reagent, reag. Ph. Eur., ≥99.8% (GC)
Sigma-Aldrich
1-オクタデセン, technical grade, 90%
Sigma-Aldrich
トルエン, puriss. p.a., ACS reagent, reag. ISO, reag. Ph. Eur., ≥99.7% (GC)
Sigma-Aldrich
アセトン, puriss. p.a., ACS reagent, reag. ISO, reag. Ph. Eur., ≥99.5% (GC)
Sigma-Aldrich
エタノール, JIS special grade, ≥99.5%
Sigma-Aldrich
ヨウ化水素酸, contains no stabilizer, ACS reagent, 55%
Sigma-Aldrich
ヨウ化水素酸, contains no stabilizer, distilled, 57 wt. % in H2O, 99.99% trace metals basis
Sigma-Aldrich
N,N-ジメチルホルムアミド, ReagentPlus®, ≥99%
Sigma-Aldrich
テトラヒドロフラン, ReagentPlus®, ≥99.0%, contains 250 ppm BHT as inhibitor
Sigma-Aldrich
N,N-ジメチルホルムアミド, for molecular biology, ≥99%