Pular para o conteúdo
Merck
Todas as fotos(2)

Documentos Principais

Visualizar Toda a Documentação

688509

Sigma-Aldrich

Silicon tetrachloride

packaged for use in deposition systems

Sinônimo(s):

STC, Tetrachlorosilane

Faça loginpara ver os preços organizacionais e de contrato
Todas as fotos(2)

About This Item

Fórmula linear:
SiCl4
Número CAS:
10026-04-7
Peso molecular:
169.90
Número MDL:
MFCD00011229
Código UNSPSC:
12352103
ID de substância PubChem:
329761169
NACRES:
NA.23

densidade de vapor

5.86 (vs air)

pressão de vapor

420 mmHg ( 37.7 °C)

Ensaio

99.998% trace metals basis

Formulário

liquid

adequação da reação

core: silicon

p.e.

57.6 °C (lit.)

pf

−70 °C (lit.)

densidade

1.483 g/mL at 25 °C (lit.)

cadeia de caracteres SMILES

Cl[Si](Cl)(Cl)Cl

InChI

1S/Cl4Si/c1-5(2,3)4

chave InChI

FDNAPBUWERUEDA-UHFFFAOYSA-N

Procurando produtos similares? Visita Guia de comparação de produtos

Descrição geral

Atomic number of base material: 14 Silicon

Aplicação

Precursors Packaged for Depositions Systems

Pictogramas

Skull and crossbonesCorrosion
GHS06,GHS05

Palavra indicadora

Danger

Frases de perigo

H301 + H331,H314,H335

Classificações de perigo

Acute Tox. 3 Inhalation - Acute Tox. 3 Oral - Eye Dam. 1 - Skin Corr. 1A - STOT SE 3

Órgãos-alvo

Respiratory system

Perigos de suplementos

EUH014,EUH071

Código de classe de armazenamento

6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects

Classe de risco de água (WGK)

WGK 1

Ponto de fulgor (°F)

Not applicable

Ponto de fulgor (°C)

Not applicable

Equipamento de proteção individual

Faceshields, Gloves, Goggles

Escolha uma das versões mais recentes:

Certificados de análise (COA)

Lot/Batch Number
SHBM7565
SHBK6266
SHBF7138V
06618LH

Não está vendo a versão correta?

Se precisar de uma versão específica, você pode procurar um certificado específico pelo número do lote ou da remessa.

Pesquise por COA

Já possui este produto?

Encontre a documentação dos produtos que você adquiriu recentemente na biblioteca de documentos.

Visite a Biblioteca de Documentos

Os clientes também visualizaram

Slide 1 of 2

1 of 2

2-Methyltetrahydrofuran analytical standard

Supelco

85488

2-Methyltetrahydrofuran

Tetrakis(dimethylamido)titanium(IV) packaged for use in deposition systems

Sigma-Aldrich

669008

Tetrakis(dimethylamido)titanium(IV)

J R Piascik et al.
Dental materials : official publication of the Academy of Dental Materials, 25(9), 1116-1121 (2009-04-21)
The overall goal of this research was to develop a practical method to chemically modify the surface of high strength dental ceramics (i.e. zirconia) to facilitate viable, robust adhesive bonding using commercially available silanes and resin cements. Investigation focused on
Sherif Zein El Abedin et al.
Accounts of chemical research, 40(11), 1106-1113 (2007-05-25)
Due to their wide thermal windows, ionic liquids can be regarded as the missing link between aqueous/organic solutions and high-temperature molten salts. They can be employed efficiently for the coating of other metals with thin layers of tantalum, aluminum, and
Roman A Sandler et al.
Journal of vision, 15(9), 16-16 (2015-08-01)
Receptive field identification is a vital problem in sensory neurophysiology and vision. Much research has been done in identifying the receptive fields of nonlinear neurons whose firing rate is determined by the nonlinear interactions of a small number of linear
C Schulze Isfort et al.
Toxicology letters, 186(3), 148-151 (2008-12-31)
Synthetic nanoscaled metal oxides are mainly produced by pyrogenic decomposition of precursors in the gas phase using a hot-wall or plasma reactor. Due to their low production rate and limited scalability, these processes are of minor technical relevance in manufacturing
Baker Jawabrah Al-Hourani et al.
Bioorganic & medicinal chemistry letters, 22(6), 2235-2238 (2012-02-22)
A series of novel 5-substituted 1H-tetrazoles as cyclooxygenase-2 (COX-2) inhibitors was prepared via treatment of various diaryl amides with tetrachlorosilane/sodium azide. All compounds were tested in cyclooxygenase (COX) assays in vitro to determine COX-1 and COX-2 inhibitory potency and selectivity.
Exibir todos os documentos relacionados

Artigos

The Savannah ALD System - An Excellent Tool for Atomic Layer Deposition

igma-Aldrich.com presents an article regarding the savannah ALD system - an excellent tool for atomic layer deposition.

Silicon Nitride Atomic Layer Deposition: A Brief Review of Precursor Chemistry

atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer

High Purity Metalorganic Precursors for CPV Device Fabrication

High Purity Metalorganic Precursors for CPV Device Fabrication

Recent Progress in Spintronic Materials

Spin-based electronic (spintronic) devices offer significant improvement to the limits of conventional charge-based memory and logic devices which suffer from high power usage, leakage current, performance saturation, and device complexity.

Ver tudo

Nossa equipe de cientistas tem experiência em todas as áreas de pesquisa, incluindo Life Sciences, ciência de materiais, síntese química, cromatografia, química analítica e muitas outras.

Entre em contato com a assistência técnica