651826
Chromium etchant
standard
Sinônimo(s):
Cr etching solution
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About This Item
Produtos recomendados
grau
standard
Nível de qualidade
composição
volatiles, 85%
cor
orange
p.e.
100 °C/1 atm
densidade
1.16 g/mL at 25 °C
Descrição geral
- Appearance - Clear orange
- pH - Acidic
- Etch Rate at 40 °C - 40 Å/second
- Etch Capacity (rate declines at ~70%) - 65 g/gallon
- Shelf Life - 1 year
- Storage Conditions - Ambient
- Filtration - 0.2 µm
- Recommended Operating Temperatures - 20-80 °C (30-40 °C most common)
- Rinse - Deionized water
- Photoresist Recommendations - KLT6000 Series, KLT 5300 Series, HARE SQT (SU-8 type), TRANSIST, or PKP -308PI
- Select Compatible Materials - Au, Ti, oxide, nitride, Si
- Select Incompatible Materials - Al, Ni, Cu, NiCr
- Compatible Plastics - HDPE, PP, PTFE, PFA, PVC
- Isotropy - Isotropic
- Incompatible Chemicals - Strong bases
Ceric ammonium nitrate-based etchant. Etch rate of 40 Å/sec @ room temp. Etches cleanly with only a deionized water rinse needed.
Chromium etchant is a chromium based solution that removes the excess metal from the substrate. These etchants are majorly used in metal finishing and electronic industry. It has an etch rate of 4 mm/s and can be used to etch nickel, copper, and chromium based excess metals.
Our chromium etchant is high purity ceric ammonium nitrate system for precise, clean etching of chromium and chromium oxide films. Compatible with positive and negative photoresists. Our chromium etchant is filtered to remove all particulates above 0.2 microns. Etching temperature varies depending on film thickness. Etch times range from 15 seconds to 60 seconds at room temperature. Chromium Etchants should be operated in a well-ventilated hood.
Aplicação
For use at room temperature or elevated temperature. Etches cleanly, eliminating need for an intermediate rinse. Etching temperature varies with regard to film thickness. Etch times range from 15 to 60 seconds at room temperature. Note, chromium etchants should be handled in a well ventilated hood.
The product can etch Al, Cr, Cu, Ni, GaAs. It can surface oxidize Si, Ta/TaN, however, it has no effect on Au, Si3N4, SiO2, Ti, and W surfaces
Características e benefícios
Designed for precise, clean etching of chromium and chromium oxide films. Compatible with both positive and negative photoresists. Filtered to 0.2 micron to remove particlulates.
Palavra indicadora
Danger
Frases de perigo
Declarações de precaução
Classificações de perigo
Aquatic Chronic 2 - Eye Dam. 1 - Met. Corr. 1 - Ox. Liq. 2 - Skin Corr. 1B - Skin Sens. 1
Perigos de suplementos
Código de classe de armazenamento
5.1B - Oxidizing hazardous materials
Classe de risco de água (WGK)
WGK 3
Ponto de fulgor (°F)
Not applicable
Ponto de fulgor (°C)
Not applicable
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Protocolos
Negative Photoresist Procedure
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