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408964

Sigma-Aldrich

Cyclohexyl methacrylate

≥97%, contains ~60 ppm monomethyl ether hydroquinone as inhibitor

Sinônimo(s):

Methacrylic acid cyclohexyl ester

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About This Item

Fórmula linear:
CH2=C(CH3)COOC6H11
Número CAS:
Peso molecular:
168.23
Beilstein:
2045235
Número CE:
Número MDL:
Código UNSPSC:
12162002
ID de substância PubChem:
NACRES:
NA.23

Nível de qualidade

Ensaio

≥97%

forma

liquid

contém

~60 ppm monomethyl ether hydroquinone as inhibitor

índice de refração

n20/D 1.458 (lit.)

pb

68-70 °C/4 mmHg (lit.)

densidade

0.964 g/mL at 25 °C (lit.)

cadeia de caracteres SMILES

CC(=C)C(=O)OC1CCCCC1

InChI

1S/C10H16O2/c1-8(2)10(11)12-9-6-4-3-5-7-9/h9H,1,3-7H2,2H3

chave InChI

OIWOHHBRDFKZNC-UHFFFAOYSA-N

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Descrição geral

Cyclohexyl methacrylate(CHMA) is an acrylate monomer with a high-refractive index, commonly used in ultraviolet (UV) curing processes due to its ability to rapidly polymerize under UV light exposure. UV-curable CHMA-based coatings, adhesives, and inks offer fast curing, excellent hardness, hydrophobicity, and high durability. It has good optical clarity, resulting in optical lenses with high transparency and minimal distortion. It can also be used as a crosslinking agent in copolymer systems for dental composites and tissue engineering to enhance the mechanical and thermal properties of the resulting materials.

Aplicação

Cyclohexyl methacrylate can be used:



  • As a monomer to prepare poly(cyclohexyl methacrylate) (PCHMA) thin films for high-performance luminescent solar concentrators(LSCs). These LSCs can be used to fabricate high-quantum yield photovoltaic solar cells.
  • As a comonomer to prepare photo-patternable quantum dot-acrylate resins for fabricating light-emitting diodes with high color transparency.
  • As a monomer to synthesizesuperhydrophobic silica nanoparticle surfaces for various applications such as anti-corrosionsurfaces, drag reduction, and energy conservation.

Pictogramas

Exclamation mark

Palavra indicadora

Warning

Frases de perigo

Classificações de perigo

Eye Irrit. 2 - Skin Irrit. 2 - Skin Sens. 1 - STOT SE 3

Órgãos-alvo

Respiratory system

Código de classe de armazenamento

10 - Combustible liquids

Classe de risco de água (WGK)

WGK 1

Ponto de fulgor (°F)

181.4 °F

Ponto de fulgor (°C)

83 °C

Equipamento de proteção individual

Eyeshields, Gloves, type ABEK (EN14387) respirator filter


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Florian Jakobs et al.
Materials (Basel, Switzerland), 13(8) (2020-04-29)
For most kinds of active polymer optical fibers, a homogeneous distribution of dye molecules over the entire fiber length and cross section is required. In this study, chemical bonding of dyes to poly(methyl methacrylate) (PMMA) by copolymerization is achieved within
Leonard I Atanase et al.
Journal of colloid and interface science, 549, 171-178 (2019-04-29)
The interpolymer complex formation between poly(vinylpyridine)-based polymers with poly(acrylic acid) (PAA), in aqueous or organic medium, is driven by the hydrogen-bonding complexation. Well-defined nanostructures, with specific practical applications, may be obtained by taking advantage of such non-covalent interactions. Poly(2-vinylpyridine)-b-poly(cyclohexyl methacrylate)

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