643262

Gold coated silicon wafer

99.999% (Au), layer thickness 1000 Å, 99.99% (Ti)

• Linear Formula: Au
• Molecular Weight: 196.97
• MDL number: MFCD00003436
• PubChem Substance ID: 329759955
• NACRES: NA.23

Properties

• Quality Level: 100
• assay: 99.99% (Ti); 99.999% (Au)
• diam. × thickness: 4 in. × 500 μm
• layer thickness: 1000 Å
• matrix attachment: Titanium, as adhesion layer used to bind the gold to the silicon wafer.
• SMILES string: [Au]
• InChI: 1S/Au
• InChI key: PCHJSUWPFVWCPO-UHFFFAOYSA-N

Description

General description

Our gold-coated silicon wafers use electron-beam lithography to form amorphous layers (50Å of titanium followed by 1000Å of gold) on top of the silicon wafer.

The product is highly crystalline, with <111> orientation gold and <100> orientation silicon wafer is used. Titanium is used as an adhesion layer to bind gold to the silicon wafer.

Application

Gold coated silicon wafers may be used in soft lithography for micro and nanoscale patterning.

Packaging

1 ea in padded box

Packaging 1 set in single wafer shipper

Safety Information

• Storage Class Code: 13 - Non Combustible Solids
• WGK: WGK 3
• Flash Point(F): Not applicable
• Flash Point(C): Not applicable