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形狀
liquid
折射率
n20/D 1.487 (lit.)
bp
155 °C/0.01 mmHg (lit.)
mp
21 °C (lit.)
密度
1.566 g/mL at 25 °C (lit.)
SMILES 字串
CCO[Ta](OCC)(OCC)(OCC)OCC
InChI
1S/5C2H5O.Ta/c5*1-2-3;/h5*2H2,1H3;/q5*-1;+5
InChI 密鑰
HSXKFDGTKKAEHL-UHFFFAOYSA-N
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應用
Tantalum(V) ethoxide precursor is used to deposit ultra thin films of Tantalum oxide and other tantalum containing films by atomic layer deposition and chemical vapor deposition methods
訊號詞
Warning
危險聲明
危險分類
Flam. Liq. 3
儲存類別代碼
3 - Flammable liquids
水污染物質分類(WGK)
WGK 1
閃點(°F)
84.2 °F - closed cup
閃點(°C)
29 °C - closed cup
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