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Merck

Holey Graphene as a Weed Barrier for Molecules.

ACS nano (2015-10-02)
Matthew L Gethers, John C Thomas, Shan Jiang, Nathan O Weiss, Xiangfang Duan, William A Goddard, Paul S Weiss
要旨

We demonstrate the use of "holey" graphene as a mask against molecular adsorption. Prepared porous graphene is transferred onto a Au{111} substrate, annealed, and then exposed to dilute solutions of 1-adamantanethiol. In the pores of the graphene lattice, we find islands of organized, self-assembled molecules. The bare Au in the pores can be regenerated by postdeposition annealing, and new molecules can be self-assembled in the exposed Au region. Graphene can serve as a robust, patternable mask against the deposition of self-assembled monolayers.

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