900814

SLAP TM

≥95%

• Sinonimo/i: 2-(((Trimethylsilyl)methyl)thio)ethanamine
• Formula empirica (notazione di Hill): C₆H₁₇NSSi
• Numero CAS: 1226877-72-0
• Peso molecolare: 163.36
• Codice UNSPSC: 12352200
• NACRES: NA.22

Proprietà

• Saggio: ≥95%
• Stato: liquid
• Indice di rifrazione: n/D 1.4811
• Densità: 0.90746 g/mL
• Gruppo funzionale: amine; thioether
• Temperatura di conservazione: 2-8°C
• Stringa SMILE: NCCSC[Si](C)(C)C

Descrizione

Applicazioni

When used with aliphatic or aromatic aldehydes, this silicon amine protocol (SLAP) reagent enables the photomediated synthesis of thiomorpholines and thiazepanes. For photocatalytic cross-coupling with this SLAP Reagent, Ir[(ppy)₂dtbbpy]PF₆ ((747769) is used with a recommended starting combination of Lewis acids Bi(OTf)₃ (633305) and Cu(OTf)₂ (283673) prior to subsequent substrate-specific optimization. This product was introduced in collaboration with the Bode Research Group and provides a tin-free alternative to SnAP (tin amine protocol) reagents and is well-suited for scale-up reactions.

Altre note

• Technology Spotlight: SLAP Reagents for Piperazine Synthesis
• Silicon Amine Reagents for the Photocatalytic Synthesis of Piperazines from Aldehydes and Ketones
• Lewis Acid Induced Toggle from Ir(II) to Ir(IV) Pathways in Photocatalytic Reactions: Synthesis of Thiomorpholines and Thiazepanes from Aldehydes and SLAP Reagents.
• Continuous Flow Synthesis of Morpholines and Oxazepanes with Silicon Amine Protocol (SLAP) Reagents and Lewis Acid Facilitated Photoredox Catalysis

Informazioni sulla sicurezza

• Codice della classe di stoccaggio: 10 - Combustible liquids
• Classe di pericolosità dell'acqua (WGK): WGK 3
• Punto d’infiammabilità (°F): 174.0 °F
• Punto d’infiammabilità (°C): 78.89 °C