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儲存溫度
2-8°C
一般說明
Aldrich®负性光致抗蚀剂套装I由用于光蚀刻的材料组成。该光致抗蚀剂可旋涂于玻璃基质上以形成电极阵列。该套装还可用于在玻璃表面上进行掩膜和成像。
應用
Aldrich®负性光致抗蚀剂套装I已被用于通过光刻法制造微电极。它还可用于制造基于液滴的微流控器件、微流控芯片、玻璃光波导和集成光栅耦合器。
法律資訊
Aldrich is a registered trademark of Sigma-Aldrich Co. LLC
訊號詞
Danger
危險分類
Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Acute Tox. 4 Oral - Aquatic Chronic 2 - Asp. Tox. 1 - Carc. 2 - Eye Dam. 1 - Repr. 1B - Skin Corr. 1 - STOT RE 2 Inhalation - STOT SE 3
標靶器官
Central nervous system,Liver,Kidney, Respiratory system
儲存類別代碼
6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects
閃點（°F）
Not applicable
閃點（°C）
Not applicable
其他客户在看
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Fabrication and characterization of optical waveguides and grating couplers
J P Sharpe, et al.
European Journal of Physics, 34, 1317-1317 (2013)
High-speed droplet actuation on single-plate electrode arrays
Banerjee AN, et al.
Journal of Colloid and Interface Science, 362(2), 567-574 (2011)
实验方案
Our photoresist kit was designed to have the necessary chemical components for each step in the lithographic process. The component materials are provided in pre-weighed quantities for your convenience. Etchants are available separately so that the proper etchant can be chosen for a variety of substrate choices.
我们的科学家团队拥有各种研究领域经验，包括生命科学、材料科学、化学合成、色谱、分析及许多其他领域.
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