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分子量
average Mw 60,000-70,000 (polyisoprene)
成份
solids, 27-29 wt. %
介電常數
2.4
表面張力
29.2 dyn/cm
黏度
465-535 cP(25 °C)
bp
122-142 °C (lit.)
密度
0.89 g/mL at 25 °C (lit.)
λmax
310-480 nm
儲存溫度
2-8°C
SMILES 字串
O1C(OCC(C1)(C)C)CCCCCCCC
InChI
1S/C14H28O2/c1-4-5-6-7-8-9-10-13-15-11-14(2,3)12-16-13/h13H,4-12H2,1-3H3
InChI 密鑰
UBZVSDZJBLSIJG-UHFFFAOYSA-N
一般說明
訊號詞
Danger
危險分類
Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Aquatic Chronic 3 - Asp. Tox. 1 - Eye Irrit. 2 - Flam. Liq. 3 - Repr. 1B - Skin Irrit. 2 - STOT SE 3
標靶器官
Respiratory system
儲存類別代碼
3 - Flammable liquids
水污染物質分類(WGK)
WGK 3
閃點(°F)
75.2 °F - closed cup
閃點(°C)
24 °C - closed cup
個人防護裝備
Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter
实验方案
Our photoresist kit was designed to have the necessary chemical components for each step in the lithographic process. The component materials are provided in pre-weighed quantities for your convenience. Etchants are available separately so that the proper etchant can be chosen for a variety of substrate choices.
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