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394505

Sigma-Aldrich

Xenon difluoride

99.99% trace metals basis

Synonym(s):

Xenon Fluoride (XeF2)

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About This Item

Linear Formula:
XeF2
CAS Number:
13709-36-9
Molecular Weight:
169.29
EC Number:
237-251-2
MDL number:
MFCD00040538
UNSPSC Code:
12352300
PubChem Substance ID:
24864601
NACRES:
NA.23

vapor pressure

3.8 mmHg ( 25 °C)

assay

99.99% trace metals basis

form

crystals

mp

129 °C (lit.)

density

4.32 g/mL at 25 °C (lit.)

SMILES string

F[Xe]F

InChI

1S/F2Xe/c1-3-2

InChI key

IGELFKKMDLGCJO-UHFFFAOYSA-N

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General description

Xenon fluoride may be obtained by interacting elemental xenon and fluorine in the temperature range of 473-523 oC and 5 absolute atmosphere. Xenon difluoride readily interacts with Lewis acid and forms complexes.

Application

Very useful fluorination agent. Xenon fluoride may be used as a fluorinating agent to analyze sulphur, selenium and tellurium by gas chromatography.

Packaging

Packaged in PFA/FEP bottles

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Danger

Hazard Classifications

Acute Tox. 1 Inhalation - Acute Tox. 3 Oral - Eye Dam. 1 - Ox. Sol. 2 - Skin Corr. 1B

Storage Class

5.1B - Oxidizing hazardous materials

wgk_germany

WGK 3

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges

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Certificates of Analysis (COA)

Lot/Batch Number
MKCN7572
MKCJ4158
MKCD3827
MKCB9326
MKBX9556V

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Use of Xenon difluoride for the determination of sulfur, selenium and tellurium as the volatile fluorides by gas chromatography
Aleinikov NN, et al.
Russian Chemical Bulletin, 22(11), 2552-2554 (1973)
Infrared spectra of complex compounds of xenon difluoride with ruthenium pentafluoride
Prusakov VN, et al.
Journal of Applied Spectroscopy, 17(1), 920-922 (1972)
Fluorination with XeF(2).(1) 44. Effect of Geometry and Heteroatom on the Regioselectivity of Fluorine Introduction into an Aromatic Ring.
Marko Zupan et al.
The Journal of organic chemistry, 63(3), 878-880 (2001-10-24)
Tsung Yi Chiang et al.
Journal of synchrotron radiation, 17(1), 69-74 (2009-12-24)
The synchrotron radiation (SR) stimulated etching of silicon elastomer polydimethylsiloxane (PDMS) using XeF(2) as an etching gas has been demonstrated. An etching system with differential pumps and two parabolic focusing mirrors was constructed to perform the etching. The PDMS was
Minseob Kim et al.
Nature chemistry, 2(9), 784-788 (2010-08-24)
The application of pressure, internal or external, transforms molecular solids into extended solids with more itinerant electrons to soften repulsive interatomic interactions in a tight space. Examples include insulator-to-metal transitions in O(2), Xe and I(2), as well as molecular-to-non-molecular transitions
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