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371904

Sigma-Aldrich

1,3-Divinyltetramethyldisiloxane

97%

Synonym(s):

1,1,3,3-Tetramethyl-1,3-divinyldisiloxane

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About This Item

Linear Formula:
[H2C=CHSi(CH3)2]2O
CAS Number:
2627-95-4
Molecular Weight:
186.40
Beilstein/REAXYS Number:
1762585
EC Number:
220-099-6
MDL number:
MFCD00014933
UNSPSC Code:
12162002
PubChem Substance ID:
24863134
NACRES:
NA.23

assay

97%

form

liquid

refractive index

n20/D 1.411 (lit.)

bp

139 °C (lit.)

mp

−99 °C (lit.)

density

0.809 g/mL at 25 °C (lit.)

SMILES string

C[Si](C)(O[Si](C)(C)C=C)C=C

InChI

1S/C8H18OSi2/c1-7-10(3,4)9-11(5,6)8-2/h7-8H,1-2H2,3-6H3

InChI key

BITPLIXHRASDQB-UHFFFAOYSA-N

Application


  • Synthesis and Studies on the Effect of Phenyl Side–Chain Content on Refractive Index of Polysiloxane Resin: This study used 1,3-divinyltetramethyldisiloxane as a terminating agent to modify polysiloxane resin properties (Ramli et al., 2015).

  • Undecenoic Acid-Based Polydimethylsiloxanes Obtained by Hydrosilylation and Hydrothiolation Reactions: This paper explored the use of 1,3-divinyltetramethyldisiloxane as a blocking agent in the synthesis of polydimethylsiloxanes (Milenin et al., 2020).

  • Efficient Improvement in Electrochemical Properties of High-Voltage Li-rich Mn-Based Layered Oxide Cathode by Addition of 1,3-divinyltetramethyldisiloxane: The additive 1,3-divinyltetramethyldisiloxane was used to enhance electrochemical properties of Li-rich layered oxide cathode (Huang et al., 2023).

pictograms

Flame
GHS02

signalword

Danger

hcodes

H225

Hazard Classifications

Flam. Liq. 2

Storage Class

3 - Flammable liquids

wgk_germany

WGK 3

flash_point_f

71.1 °F - closed cup

flash_point_c

21.7 °C - closed cup

ppe

Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter

Certificates of Analysis (COA)

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Seungmin Shin et al.
Nanotechnology, 27(47), 475301-475301 (2016-10-27)
Novel polyhedral oligomeric silsesquioxane (POSS) resists, which are based on a new photo-crosslinking system via Wolff rearrangement, are developed as ideal replica mold materials for ultraviolet-nanoimprint lithography. These POSS resist materials are synthesized by incorporating diazoketo and hydroxyl groups into
B Sivaranjini et al.
Scientific reports, 8(1), 8891-8891 (2018-06-13)
A simple and effective approach for vertical alignment of liquid crystals (LCs) over a functionalized transparent flexible substrate is described. Surface characterization of this commercially available plastic substrate through X-ray photoelectron spectroscopy (XPS) and attenuated total reflection infrared spectroscopy (ATR-IR)

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