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Merck
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重要文件

371904

Sigma-Aldrich

1,3-二乙烯基四甲基二硅氧烷

97%

同義詞:

1,1,3,3-四甲基-1,3-二乙烯基二硅氧烷

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About This Item

線性公式:
[H2C=CHSi(CH3)2]2O
CAS號碼:
分子量::
186.40
Beilstein:
1762585
EC號碼:
MDL號碼:
分類程式碼代碼:
12162002
PubChem物質ID:
NACRES:
NA.23

品質等級

化驗

97%

形狀

liquid

折射率

n20/D 1.411 (lit.)

bp

139 °C (lit.)

mp

−99 °C (lit.)

密度

0.809 g/mL at 25 °C (lit.)

SMILES 字串

C[Si](C)(O[Si](C)(C)C=C)C=C

InChI

1S/C8H18OSi2/c1-7-10(3,4)9-11(5,6)8-2/h7-8H,1-2H2,3-6H3

InChI 密鑰

BITPLIXHRASDQB-UHFFFAOYSA-N

應用


  • Synthesis and Studies on the Effect of Phenyl Side–Chain Content on Refractive Index of Polysiloxane Resin: This study used 1,3-divinyltetramethyldisiloxane as a terminating agent to modify polysiloxane resin properties (Ramli et al., 2015).

  • Undecenoic Acid-Based Polydimethylsiloxanes Obtained by Hydrosilylation and Hydrothiolation Reactions: This paper explored the use of 1,3-divinyltetramethyldisiloxane as a blocking agent in the synthesis of polydimethylsiloxanes (Milenin et al., 2020).

  • Efficient Improvement in Electrochemical Properties of High-Voltage Li-rich Mn-Based Layered Oxide Cathode by Addition of 1,3-divinyltetramethyldisiloxane: The additive 1,3-divinyltetramethyldisiloxane was used to enhance electrochemical properties of Li-rich layered oxide cathode (Huang et al., 2023).

象形圖

Flame

訊號詞

Danger

危險聲明

危險分類

Flam. Liq. 2

儲存類別代碼

3 - Flammable liquids

水污染物質分類(WGK)

WGK 3

閃點(°F)

71.1 °F - closed cup

閃點(°C)

21.7 °C - closed cup

個人防護裝備

Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter


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分析證明 (COA)

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Seungmin Shin et al.
Nanotechnology, 27(47), 475301-475301 (2016-10-27)
Novel polyhedral oligomeric silsesquioxane (POSS) resists, which are based on a new photo-crosslinking system via Wolff rearrangement, are developed as ideal replica mold materials for ultraviolet-nanoimprint lithography. These POSS resist materials are synthesized by incorporating diazoketo and hydroxyl groups into
B Sivaranjini et al.
Scientific reports, 8(1), 8891-8891 (2018-06-13)
A simple and effective approach for vertical alignment of liquid crystals (LCs) over a functionalized transparent flexible substrate is described. Surface characterization of this commercially available plastic substrate through X-ray photoelectron spectroscopy (XPS) and attenuated total reflection infrared spectroscopy (ATR-IR)

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