Skip to Content
MilliporeSigma
All Photos(1)

Key Documents

View All Documentation

274208

Sigma-Aldrich

Dichlorodiethylsilane

97%

Synonym(s):

Diethyldichlorosilane, Diethyldichlorosilicon

Sign Into View Organizational & Contract Pricing
All Photos(1)

About This Item

Linear Formula:
(C2H5)2SiCl2
CAS Number:
1719-53-5
Molecular Weight:
157.11
Beilstein/REAXYS Number:
605313
EC Number:
217-005-0
MDL number:
MFCD00000493
UNSPSC Code:
12352001
PubChem Substance ID:
24856572
NACRES:
NA.22

Quality Level

100

assay

97%

form

liquid

refractive index

n20/D 1.43 (lit.)

bp

125-131 °C (lit.)

density

1.05 g/mL at 25 °C (lit.)

storage temp.

2-8°C

SMILES string

CC[Si](Cl)(Cl)CC

InChI

1S/C4H10Cl2Si/c1-3-7(5,6)4-2/h3-4H2,1-2H3

InChI key

BYLOHCRAPOSXLY-UHFFFAOYSA-N

Looking for similar products? Visit Product Comparison Guide

signalword

Danger

Hazard Classifications

Acute Tox. 4 Oral - Eye Dam. 1 - Flam. Liq. 3 - Skin Corr. 1B - STOT SE 3

target_organs

Respiratory system

supp_hazards

EUH014

Storage Class

3 - Flammable liquids

wgk_germany

WGK 1

flash_point_f

79.0 °F

flash_point_c

26.1 °C

ppe

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter

Choose from one of the most recent versions:

Certificates of Analysis (COA)

Lot/Batch Number
MKCQ3829
SHBJ6395
SHBD3497V
SHBB1443V
28496CK

Don't see the Right Version?

If you require a particular version, you can look up a specific certificate by the Lot or Batch number.

Search for a COA

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

Peter Bieling et al.
The EMBO journal, 37(1), 102-121 (2017-11-17)
WASP-family proteins are known to promote assembly of branched actin networks by stimulating the filament-nucleating activity of the Arp2/3 complex. Here, we show that WASP-family proteins also function as polymerases that accelerate elongation of uncapped actin filaments. When clustered on
David Gräfe et al.
Nature communications, 9(1), 2788-2788 (2018-07-19)
Existing photoresists for 3D laser lithography that can be removed after development in a subtractive manner typically suffer from harsh cleavage conditions. Here, we report chemoselectively cleavable photoresists for 3D laser lithography based on silane crosslinkers, allowing the targeted degradation

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service