추천 제품
Grade
analytical standard
Quality Level
분석
≥99.0% (GC)
기술
HPLC: suitable
gas chromatography (GC): suitable
mp
81-84 °C
응용 분야
cleaning products
cosmetics
environmental
food and beverages
personal care
형식
neat
SMILES string
COc1ccc(cc1)C(=O)CC(=O)c2ccc(cc2)C(C)(C)C
InChI
1S/C20H22O3/c1-20(2,3)16-9-5-14(6-10-16)18(21)13-19(22)15-7-11-17(23-4)12-8-15/h5-12H,13H2,1-4H3
InChI key
XNEFYCZVKIDDMS-UHFFFAOYSA-N
유사한 제품을 찾으십니까? 방문 제품 비교 안내
일반 설명
Avobenzone is an UVA filter. It is used in sunscreen lotions and cosmetic formulations. It has maximum absorption at ca 340–350 nm, decreasing under UV irradiation resulting in loss of the UVA protecting effect. Its photostability is very sensitive as it is stable in polar protic solvent and is photolabile in nonpolar solvents.
애플리케이션
Avobenzone may be used as an analytical reference standard for the quantification of the analyte in the following:
Avobenzone may be used to study the photophysical characteristics, photosensitizing activity of a blocked diketo form derived from 4-tert-butyl-4′-methoxydibenzoylmethane (BM-DBM).
- Sunscreen formulations using reversed-phase high-performance liquid chromatography with diode array detection (RP-HPLC-DAD).
- Freshwater, saline water samples, rat plasma and skin layers using liquid chromatography-positive electrospray ionization-tandem mass spectrometry (LC-ESI-MS/MS) in multiple reaction monitoring mode (MRM).
Avobenzone may be used to study the photophysical characteristics, photosensitizing activity of a blocked diketo form derived from 4-tert-butyl-4′-methoxydibenzoylmethane (BM-DBM).
Refer to the product′s Certificate of Analysis for more information on a suitable instrument technique. Contact Technical Service for further support.
유해 및 위험 성명서
예방조치 성명서
Hazard Classifications
Aquatic Chronic 4
Storage Class Code
11 - Combustible Solids
WGK
WGK 2
개인 보호 장비
Eyeshields, Gloves
가장 최신 버전 중 하나를 선택하세요:
이미 열람한 고객
A sensitive LC?ESI-MS/MS method for the quantification of avobenzone in rat plasma and skin layers: Application to a topical administration study
Kim GM, et al.
Journal of Chromatography. B, Biomedical Sciences and Applications, 1003, 41-46 (2015)
Serge Forestier
Journal of the American Academy of Dermatology, 58(5 Suppl 2), S133-S138 (2008-04-25)
The risks associated with cumulative or overexposure to ultraviolet (UV) radiation are now well identified. They involve both UVB (290-320 nm) and UVA (320-400 nm) components. UVB radiation is still considered to be the major factor responsible for most harmful
Ibrahim Hanno et al.
Pharmaceutical research, 29(2), 559-573 (2011-09-23)
To prepare polyamide nanocapsules for skin photo-protection, encapsulating α-tocopherol, Parsol®MCX (ethylhexyl methoxycinnamate) and/or Parsol®1789 (butyl methoxydibenzoylmethane). Nanocapsules were obtained by combining spontaneous emulsification and interfacial polycondensation reaction between sebacoyl chloride and diethylenetriamine. Nano-emulsions used as control were obtained by the
Esther J H Collaris et al.
International journal of dermatology, 47 Suppl 1, 35-37 (2008-11-15)
Over the last decade, a change in the public awareness regarding the possible danger of excessive sunlight exposure has resulted in an increased consumption of sunscreens. These products contain a broad spectrum of putative sensitizers that can cause contact dermatitis
Cecilia Paris et al.
Photochemistry and photobiology, 85(1), 178-184 (2008-08-05)
Novel sunscreens are required providing active protection in the UVA and UVB regions. On the other hand, there is an increasing concern about the photosafety of UV filters, as some of them are not sufficiently photostable. Avobenzone is one of
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