추천 제품
분석
96%
형태
liquid
refractive index
n20/D 1.475 (lit.)
bp
144-145.5 °C (lit.)
density
1.562 g/mL at 25 °C (lit.)
SMILES string
Cl[Si](Cl)(Cl)[Si](Cl)(Cl)Cl
InChI
1S/Cl6Si2/c1-7(2,3)8(4,5)6
InChI key
LXEXBJXDGVGRAR-UHFFFAOYSA-N
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일반 설명
Hexachlorodisilane (HCDS) is a chlorosilane used as a precursor for producing disilanes. It is a dioxidizer that is used in the production of silicon films and silicon nitride based films.
애플리케이션
HCDS can be used in the fabrication of silica aerogels by chemical vapor deposition (CVD), which can be potentially used as encapsulating agents and thermal insulators. It can also be used to synthesize 1,1,1,2,2,2-hexaamino-disilanes using CVD, which forms silicon-based films for microelectronic-based applications.
HCDS may be used as a reducing agent. It may be combined with ammonia to form silicon nitride by chemical vapor deposition(CVD) technique.
신호어
Danger
유해 및 위험 성명서
Hazard Classifications
Skin Corr. 1B
보충제 위험성
Storage Class Code
8A - Combustible corrosive hazardous materials
WGK
WGK 3
Flash Point (°F)
Not applicable
Flash Point (°C)
Not applicable
개인 보호 장비
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
Film Properties of Low?k Silicon Nitride Films Formed by Hexachlorodisilane and Ammonia.
Tanaka M , et al.
Journal of the Electrochemical Society, 147(6), 2284-2289 (2000)
Enhancing mechanical properties of silica aerogels
Obrey, K. A., Wilson, K. V., & Loy, D. A.
Journal of Non-Crystalline Solids, 375(19), 3435-3441 (2011)
Z Yu et al.
Journal of chromatography. A, 903(1-2), 183-191 (2001-01-12)
Carbon isotopic compositions of aetio I occurring in the form of free-base, nickel, demetallation, dihydroxysilicon(IV) and bis(tert.-butyldimethylsiloxy)silicon(IV) [(tBDMSO)2Si(IV)] have shown that it has experienced no obvious isotope fractionation during the synthesis of [(tBDMSO)2Si(IV)] porphyrin from aetio I. Here, aetio I
The Raman Spectrum of Hexachlorodisilane
Katayama M, et al.
J. Chem. Phys., 18(4), 506-509 (1950)
Chemical vapor deposition of silicon films using hexachlorodisilane
Taylor, R. C., Scott, B. A., Lin, S. T., LeGoues, F., & Tsang, J. C.
MRS Proceedings, 77, 709-709 (1986)
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