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Merck
  • Single-step preparation of two-dimensionally organized gold particles via ionic liquid/metal sputter deposition.

Single-step preparation of two-dimensionally organized gold particles via ionic liquid/metal sputter deposition.

Physical chemistry chemical physics : PCCP (2015-04-29)
Daisuke Sugioka, Tatsuya Kameyama, Susumu Kuwabata, Tsukasa Torimoto
要旨

Sputtering of noble metals, such as Au, Ag, Pd, and Pt, onto room-temperature ionic liquids (RTILs) enabled the formation of monoparticle films composed of spherical noble metal nanoparticles on the liquid surface only when the RTILs used contained hydroxyl-functionalized cations as a component. Sputter deposition of these metals under the same conditions simply produced well-dispersed metal particles without the formation of any films on the solution surface when pure RTILs with non-functionalized cations were employed. Anionic species, even those containing a hydroxyl group, did not significantly affect the formation of the particle film on the RTIL surface or dispersion of particles in the solution. The size of Au particles could be controlled by varying the sputtering condition regardless of the two-dimensional particle density, which was determined by the composition of RTILs used. An Au monoparticle film on the RTIL surface was easily transferred onto various solid substrates via the horizontal liftoff method without large aggregation even when the substrate surface was highly curved.

材料
製品番号
ブランド
製品内容

Sigma-Aldrich
アセトニトリル, anhydrous, 99.8%
Sigma-Aldrich
1-エチル-3-メチルイミダゾリウム ビス(トリフルオロメチルスルホニル)イミド, ≥98% (HPLC)
Sigma-Aldrich
酢酸1-エチル-3-メチルイミダゾリウム, ≥95.0% (HPLC)
Sigma-Aldrich
酢酸1-エチル-3-メチルイミダゾリウム, 97%
Sigma-Aldrich
1-ブチル-3-メチルイミダゾリウム テトラフルオロボラート, ≥98%
Sigma-Aldrich
1-エチル-3-メチルイミダゾリウムエチルスルファート, ≥95%
Sigma-Aldrich
1-ブチル-3-メチルイミダゾリウム テトラフルオロボラート, ≥97.0% (HPLC)
Sigma-Aldrich
1-エチル-3-メチルイミダゾリウムテトラフルオロボラート, ≥98% (HPLC)
Sigma-Aldrich
アセトニトリル, electronic grade, 99.999% trace metals basis
Sigma-Aldrich
アセトニトリル, ≥99.8%, suitable for HPLC
Sigma-Aldrich
1-ブチル-3-メチルイミダゾリウムチオシアナート, ≥95%
Sigma-Aldrich
アセトニトリル 溶液, contains 0.1 % (v/v) trifluoroacetic acid, suitable for HPLC
Sigma-Aldrich
1-メチル-3-オクチルイミダゾリウムテトラフルオロボラート, ≥97.0% (HPLC)
Sigma-Aldrich
アセトニトリル, ≥99.8%, for residue analysis, JIS 300
Sigma-Aldrich
アセトニトリル, JIS special grade, ≥99.5%
Sigma-Aldrich
アセトニトリル, ≥99.5%, ACS reagent
Sigma-Aldrich
アセトニトリル 溶液, contains 0.1 % (v/v) formic acid, suitable for HPLC
Sigma-Aldrich
アセトニトリル, SAJ first grade, ≥99.0%
Sigma-Aldrich
アセトニトリル, for chromatography
Sigma-Aldrich
アセトニトリル, ≥99.8%, for residue analysis, JIS 1000
Sigma-Aldrich
アセトニトリル, for residue analysis, JIS 5000
Sigma-Aldrich
アセトニトリル 溶液, contains 0.05 % (w/v) ammonium formate, 5 % (v/v) water, 0.1 % (v/v) formic acid, suitable for HPLC
Sigma-Aldrich
アセトニトリル 溶液, contains 0.05 % (v/v) trifluoroacetic acid