About This Item
推荐产品
化驗
≥99.0% (GC)
≥99.99% (trace metals analysis)
形狀
liquid
bp
96-99 °C/2-3 mmHg (lit.)
密度
0.944 g/mL at 25 °C (lit.)
SMILES 字串
CCC(C)(C)O[Si](O)(OC(C)(C)CC)OC(C)(C)CC
InChI
1S/C15H34O4Si/c1-10-13(4,5)17-20(16,18-14(6,7)11-2)19-15(8,9)12-3/h16H,10-12H2,1-9H3
InChI 密鑰
ORJFXWYTRPGGRK-UHFFFAOYSA-N
正在寻找类似产品? 访问 产品对比指南
一般說明
危險聲明
危險分類
Aquatic Chronic 4
儲存類別代碼
10 - Combustible liquids
水污染物質分類(WGK)
WGK 3
閃點(°F)
222.8 °F - closed cup
閃點(°C)
106 °C - closed cup
個人防護裝備
Eyeshields, Gloves
商品
Atomic Layer Deposition (ALD) is a coating technology that allows perfectly conformal deposition onto complex 3D surfaces. The reason for this uniform coating lies in the saturative chemisorption of sequential cycles of precursor vapors.
Thin film photovoltaic devices have become increasingly important in efficiently harnessing solar energy to meet consumer demand.
我们的科学家团队拥有各种研究领域经验,包括生命科学、材料科学、化学合成、色谱、分析及许多其他领域.
联系技术服务部门