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一般說明
訊號詞
Danger
危險聲明
危險分類
Eye Dam. 1 - Pyr. Liq. 1 - Skin Corr. 1B - Water-react 1
安全危害
儲存類別代碼
4.2 - Pyrophoric and self-heating hazardous materials
水污染物質分類(WGK)
nwg
閃點(°F)
No data available
閃點(°C)
No data available
個人防護裝備
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
其他客户在看
商品
In recent years considerable interest in ALD has emerged, mainly due to its ability to controllably coat even very small structures, e.g. nanoor microstructures.
Atomic layer deposition (ALD) techniques have emerged in the last ten years to meet various needs including semiconductor device miniaturization, conformal deposition on porous structures and coating of nanoparticles. ALD is based on two sequential self-limiting surface reactions.
Atomic Layer Deposition (ALD) is a coating technology that allows perfectly conformal deposition onto complex 3D surfaces. The reason for this uniform coating lies in the saturative chemisorption of sequential cycles of precursor vapors.
Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition
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