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469858

Sigma-Aldrich

四(二甲基胺基)钛(IV)

99.999% trace metals basis

别名:

TDMAT, 四(二甲基氨基)钛(IV)

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About This Item

线性分子式:
[(CH3)2N]4Ti
CAS号:
3275-24-9
分子量:
224.17
EC號碼:
221-904-3
MDL號碼:
MFCD00014861
分類程式碼代碼:
12352103
PubChem物質ID:
24870618
NACRES:
NA.23

品質等級

200

化驗

99.999% trace metals basis

形狀

liquid

反應適用性

core: titanium

bp

50 °C/0.5 mmHg (lit.)

密度

0.947 g/mL at 25 °C (lit.)

SMILES 字串

CN(C)[Ti](N(C)C)(N(C)C)N(C)C

InChI

1S/4C2H6N.Ti/c4*1-3-2;/h4*1-2H3;/q4*-1;+4

InChI 密鑰

MNWRORMXBIWXCI-UHFFFAOYSA-N

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一般說明

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應用

Tetrakis（二甲基氨基）钛（IV）（TDMAT）是通过有机金属化学气相沉积（OMCVD）和通过原子层沉积（ALD）的二氧化钛薄膜的氮化钛（TiN）薄膜的前体。TDMAT 与过量的环戊二烯发生放热反应得到三（二甲基氨基）（η5-环戊二烯基）钛（IV）。

象形圖

FlameCorrosion
GHS02,GHS05

訊號詞

Danger

危險聲明

H225,H260,H314

危險分類

Flam. Liq. 2 - Skin Corr. 1B - Water-react 1

安全危害

EUH014

儲存類別代碼

4.3 - Hazardous materials which set free flammable gases upon contact with water

水污染物質分類（WGK）

WGK 3

閃點（°F）

-22.0 °F - closed cup

閃點（°C）

-30 °C - closed cup

個人防護裝備

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter

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分析证书(COA)

Lot/Batch Number
SHBP1947
SHBL6315
SHBL2751
SHBH9716
80197MM

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四异丙醇钛 packaged for use in deposition systems

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687502

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四(乙基甲基胺基)锆(IV) ≥99.99% trace metals basis

Sigma-Aldrich

553131

四(乙基甲基胺基)锆(IV)

Tianshuo Zhao et al.
Proceedings of the National Academy of Sciences of the United States of America, 118(7) (2021-02-10)
Semiconductors of narrow bandgaps and high quantum efficiency have not been broadly utilized for photocatalytic coevolution of H2 and O2 via water splitting. One prominent issue is to develop effective protection strategies, which not only mitigate photocorrosion in an aqueous
Microstructure and elastic properties of atomic layer deposited TiO 2 anatase thin films.
Borgese L, et al.
Acta Materialia, 59(7), 2891-2900 (2011)
Young modulus and Poisson ratio measurements of TiO 2 thin films deposited with atomic layer deposition.
Borgese L, et al.
Surface and Coatings Technology, 206(8), 2459-2463 (2012)
Improving performance via blocking layers in dye-sensitized solar cells based on nanowire photoanodes.
Li L, et al.
ACS Applied Materials & Interfaces, 7(23), 12824-12831 (2015)
Chemistry of Materials, 8, 2712-2712 (1996)
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