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Merck

531081

Sigma-Aldrich

N-羟基萘酰亚胺三氟甲磺酸

electronic grade, ≥99%

别名:

N-Hydroxynaphthalimide trifluoromethanesulfonate, HNT, NHN-TF

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About This Item

经验公式(希尔记法):
C13H6F3NO5S
CAS号:
分子量:
345.25
MDL號碼:
分類程式碼代碼:
12352300
PubChem物質ID:
NACRES:
NA.23

等級

electronic grade

化驗

≥99%

mp

212.1-214.2 °C

溶解度

PGMEA: 1%
ethyl lactate: <1%
γ-butyrolactone: ~2%

SMILES 字串

FC(F)(F)S(=O)(=O)ON1C(=O)c2cccc3cccc(C1=O)c23

InChI

1S/C13H6F3NO5S/c14-13(15,16)23(20,21)22-17-11(18)8-5-1-3-7-4-2-6-9(10(7)8)12(17)19/h1-6H

InChI 密鑰

LWHOMMCIJIJIGV-UHFFFAOYSA-N

一般說明

N-羟基萘酰亚胺三氟甲磺酸 (HNT) 是一种光致酸产生剂 (PAG) ,其在紫外光辐射时形成酸,可用于生成图案化结构。它还可用于通过形成酸键而调节聚合物的溶解性。

應用

HNT可用于形成图案化纳米粒子,其有望用于半导体设备的大规模制造。它还可用于沸石的光反应性孔重开,其可促进气体渗透过程的调节。以HNT为PAG可以形成紫外辐照的三甲基甲硅烷基超薄纤维素膜。

儲存類別代碼

11 - Combustible Solids

水污染物質分類(WGK)

WGK 3

閃點(°F)

Not applicable

閃點(°C)

Not applicable

個人防護裝備

Eyeshields, Gloves, type N95 (US)


历史批次信息供参考:

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Lot/Batch Number

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Non-ionic photo-acid generators for applications in two-photon lithography
Steidl L, et al.
Journal of Materials Chemistry, 19(4), 505-513 (2009)
Selin S Suner et al.
International journal of biological macromolecules, 130, 627-635 (2019-03-07)
We present here preparation of mechanically strong and biocompatible cryogel composites based on hyaluronic acid (HA) and halloysite nanotubes (HNTs) of various compositions, and their applications as scaffold for different cell growing media. Uniaxial compression tests reveal that the incorporation
Jayabrata Maity et al.
Carbohydrate polymers, 182, 159-171 (2017-12-28)
Composite type adsorbent was prepared by integrating chitosan (Cs) with crosslinked polymethacrylic acid (PMA) and nano sized halloysite nanotube (HNT). The structure of the resulting Cs-PMA/HNT adsorbents was characterized by FTIR, NMR, XRD, TGA, SEM/EDX and rheological properties. These functional
Surface modification of zeolites using benzene-1, 4-diboronic acid to form gated micropores with mild and photo responsive pore reopening
Fujiwara M, et al.
Chemical Engineering Journal, 146(3), 520-526 (2009)
Recent progress in nanoparticle photoresists development for EUV lithography
Extreme Ultraviolet (EUV) Lithography VII, 9776(4), 977604-977604 (2016)

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