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Sigma-Aldrich

Octadecylphosphonic acid

97%

Sinônimo(s):

n-Octadecylphosphonic acid, ODPA

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About This Item

Fórmula empírica (Notação de Hill):
C18H39O3P
Número CAS:
4724-47-4
Peso molecular:
334.47
Número MDL:
MFCD00015838
Código UNSPSC:
12352300
ID de substância PubChem:
329762947
NACRES:
NA.23

Ensaio

97%

Formulário

crystals

pf

95-100 °C

cadeia de caracteres SMILES

CCCCCCCCCCCCCCCCCCP(O)(O)=O

InChI

1S/C18H39O3P/c1-2-3-4-5-6-7-8-9-10-11-12-13-14-15-16-17-18-22(19,20)21/h2-18H2,1H3,(H2,19,20,21)

chave InChI

FTMKAMVLFVRZQX-UHFFFAOYSA-N

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Descrição geral

Octadecylphosphonic acid (OPA) is used as a self-assembled monolayer that forms a surfactant which strongly bonds with the surface atoms of different metal oxides. It provides hydrophobic properties and covers a higher surface area than the predominantly used silanes.

Aplicação

Anti-corrosive coatings on cupronickel (CuNi) can be formed by fabricating a protective film of OPA by dip coating method. OPA may be used in the preparation of indium oxide(In2O3) nanowire transistor than can find potential application in the growth of fast switching and low noise nano-electronic devices. It may be used for self-cleaning and oil/water separation based applications as it forms a superhydrophobic layer on the copper mesh.

Pictogramas

Exclamation mark
GHS07

Palavra indicadora

Warning

Frases de perigo

H315,H319

Classificações de perigo

Eye Irrit. 2 - Skin Irrit. 2

Código de classe de armazenamento

11 - Combustible Solids

Classe de risco de água (WGK)

WGK 3

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Certificados de análise (COA)

Lot/Batch Number
BGBC2431V
BGBC1995V
BGBB8602
MKBJ8197V
MKBG5276V

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Fabrication of controllable and stable In2O3 nanowire transistors using an octadecylphosphonic acid self-assembled monolayer.
Lim T, et al.
Nanotechnology, 26(14), 145203-145203 (2015)
Modification of cupronickel alloy surface with octadecylphosphonic acid self-assembled films for improved corrosion resistance.
Mioc K, et al.
Corrosion Science, 134(10), 189-198 (2018)
Getachew Tizazu et al.
Langmuir : the ACS journal of surfaces and colloids, 25(18), 10746-10753 (2009-07-18)
Electron-hole pair formation at titania surfaces leads to the formation of reactive species that degrade organic materials. Here, we describe the degradation of self-assembled monolayers of alkylphosphonic acids on the native oxide of titanium following exposure to UV light. The
n-Octadecylphosphonic acid grafted mesoporous magnetic nanoparticle: Preparation, characterization, and application in magnetic solid-phase extraction.
Ding J, et al.
Journal of Chromatography A, 1217(47), 7351-7358 (2010)
Fast formation of superhydrophobic octadecylphosphonic acid (ODPA) coating for self-cleaning and oil/water separation.
Dai C, et al.
Soft Matter, 10(40), 8116-8121 (2014)
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