900755

SLAP TA

95%

• Synonym(e): 3-(((Trimethylsilyl)methyl)thio)propan-1-amine
• Empirische Formel (Hill-System): C₇H₁₉NSSi
• CAS-Nummer: 2093935-86-3
• Molekulargewicht: 177.38
• UNSPSC-Code: 12352103
• NACRES: NA.22

Eigenschaften

• Qualitätsniveau: 100
• Assay: 95%
• Form: liquid
• Dichte: 0.90452
• Funktionelle Gruppe: amine; thioether
• Lagertemp.: 2-8°C

Beschreibung

Anwendung

When used with aliphatic or aromatic aldehydes, this silicon amine protocol SLAP reagent enables the photomediated synthesis of thiomorpholines and thiazepanes. For photocatalytic cross-coupling with this SLAP Reagent, Ir[(ppy)₂dtbbpy]PF₆ (747769) is used with a recommended starting combination of Lewis acids Bi(OTf)₃ (633305) and Cu(OTf)₂ (283673) prior to subsequent substrate-specific optimization. This product was introduced in collaboration with the Bode Research Group and provides a tin-free alternative to SnAP (tin amine protocol) reagents and is well-suited for scale-up reactions.

Sonstige Hinweise

• Technology Spotlight: SLAP Reagents for Piperazine Synthesis
• Silicon Amine Reagents for the Photocatalytic Synthesis of Piperazines from Aldehydes and Ketones
• Lewis Acid Induced Toggle from Ir(II) to Ir(IV) Pathways in Photocatalytic Reactions: Synthesis of Thiomorpholines and Thiazepanes from Aldehydes and SLAP Reagents.
• Continuous Flow Synthesis of Morpholines and Oxazepanes with Silicon Amine Protocol (SLAP) Reagents and Lewis Acid Facilitated Photoredox Catalysis

Sicherheitshinweise

• Piktogramme: GHS02
• Signalwort: Warning
• H-Sätze: H226
• P-Sätze: P210 - P370 + P378
• Gefahreneinstufungen: Flam. Liq. 3
• Lagerklassenschlüssel: 3 - Flammable liquids
• WGK: WGK 3
• Flammpunkt (°F): 75.0 °F
• Flammpunkt (°C): 23.89 °C