463760
Ruthenium(IV) oxide hydrate
99.9% trace metals basis
Sinónimos:
Hydrous ruthenium oxide, Ruthenium dioxide hydrate
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About This Item
Productos recomendados
Quality Level
assay
99.9% trace metals basis
form
powder
reaction suitability
core: ruthenium
reagent type: catalyst
SMILES string
O.O=[Ru]=O
InChI
1S/H2O.2O.Ru/h1H2;;;
InChI key
FGEKTVAHFDQHBU-UHFFFAOYSA-N
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Categorías relacionadas
signalword
Warning
hcodes
pcodes
Hazard Classifications
Eye Irrit. 2
Storage Class
11 - Combustible Solids
wgk_germany
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
dust mask type N95 (US), Eyeshields, Gloves
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Biosensors & bioelectronics, 38(1), 278-283 (2012-06-30)
A non-enzymatic glucose sensor of multi-walled carbon nanotube-ruthenium oxide/composite paste electrode (MWCNT-RuO(2)/CPE) was developed. The electrode was characterized by using XRD, SEM, TEM and EIS. Meanwhile, cyclic voltammetry and amperometry were used to check on the performances of the MWCNT-RuO(2)/CPE
Scientific reports, 2, 801-801 (2012-11-13)
Controls over the atomic dispersity and particle shape of noble metal catalysts are the major qualities determining their usability in industrial runs, but they are usually difficult to be simultaneously realized. Inspired from the Deacon catalyst in which RuO(2) can
Journal of colloid and interface science, 359(1), 30-39 (2011-04-23)
Ruthenium oxides (RuO(2)·1·10H(2)O and RuO(2)) have been synthesized by forced hydrolysis and oxidation of ruthenium chloride. The resulting materials were extensively characterized to determine the crystallinity, surface area, and ruthenium oxidation state. Surface charging experiments indicate a large quantity of
Water research, 45(4), 1579-1586 (2010-12-21)
During membrane treatment of secondary effluent from wastewater treatment plants, a reverse osmosis concentrate (ROC) containing trace organic contaminants is generated. As the latter are of concern, effective and economic treatment methods are required. Here, we investigated electrochemical oxidation of
ACS applied materials & interfaces, 4(9), 4588-4594 (2012-08-23)
RuO(2) films were deposited on SiO(2) (300 nm)/N++Si substrates using radio frequency magnetron sputtering at room temperature. As-deposited RuO(2) films were annealed at different temperatures (100, 300, and 500 °C) and ambients (Ar, O(2) and vacuum), and the resulting effects
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