NIST2133

Phosphorus implant in silicon depth profile standard

NIST^® SRM^® 2133

• 分類程式碼代碼: 41116107
• NACRES: NA.24

屬性

• 等級: certified reference material
• 品質等級: 100
• 包裝: pkg of each
• 製造商／商標名: NIST^®
• 應用: semiconductor
• 形式: matrix material

描述

一般說明

The SRM contains a single crystal silicon substrate measuring 1 cm × 1 cm, which is ion-implanted with the isotope 31P at a nominal energy of 100 keV.

SRM 2133_cert

SRM 2133_SDS

應用

The SRM is intended to calibrate the secondary ion response for minor and trace concentrations of phosphorus within a silicon matrix using the secondary ion mass spectrometry (SIMS) method.

特點和優勢

• Available with certificate documenting NIST-certified retained dose of 31P atoms which is obtained through radiochemical neutron activation analysis (RNAA).
• The NIST certificate is provided with expiration certificate, storage, handling, use, and maintenance instructions.

其他說明

Example analytes are listed below as a reference. Please download a current certificate at nist.gov/SRM for current analytes and certified values.
Phosphorus (³¹P)

法律資訊

NIST is a registered trademark of National Institute of Standards and Technology

SRM is a registered trademark of National Institute of Standards and Technology

安全資訊

• 儲存類別代碼: 13 - Non Combustible Solids
• 水污染物質分類（WGK）: WGK 3
• 閃點（°F）: Not applicable
• 閃點（°C）: Not applicable