NIST2133

Phosphorus implant in silicon depth profile standard

NIST^® SRM^® 2133

• 分類程式碼代碼: 41116107
• NACRES: NA.24

屬性

• 等級: certified reference material
• 品質等級: 100
• 包裝: pkg of each
• 製造商／商標名: NIST^®
• 應用: semiconductor
• 格式: matrix material

描述

一般說明

This Standard Reference Material (SRM) is intended for use in calibrating secondary ion response to minor and trace levels of phosphorus in a silicon matrix by the analytical technique of secondary ion mass spectrometry (SIMS). SRM 2133 is intended for calibrating the response of a SIMS instrument for phosphorus in a silicon matrix under a specific set of instrumental conditions. It may also be used by a laboratory as a transfer standard for the calibration of working standards of phosphorus in silicon. This SRM consists of a 1 cm × 1 cm single crystal silicon substrate that has been ion-implanted with the isotope 31P at a nominal energy of 100 keV. For more information, please refer to the COA and SDS.

SRM 2133_cert

SRM 2133_SDS

其他說明

Example analytes are listed below as a reference. Please download a current certificate at nist.gov/SRM for current analytes and certified values.
Phosphorus (³¹P)

法律資訊

NIST is a registered trademark of National Institute of Standards and Technology

SRM is a registered trademark of National Institute of Standards and Technology

安全資訊

• 儲存類別代碼: 13 - Non Combustible Solids
• 水污染物質分類（WGK）: WGK 3
• 閃點（°F）: Not applicable
• 閃點（°C）: Not applicable