NIST2134

Arsenic implant in silicon depth profile standard

NIST SRM 2134

• 分類程式碼代碼: 41116107
• NACRES: NA.24

屬性

• 等級: certified reference material
• 品質等級: 100
• 包裝: pkg of each
• 製造商／商標名: NIST^®
• 應用: semiconductor
• 形式: matrix material

描述

一般說明

Each unit of SRM 2134 contains a single crystal silicon substrate, measuring 1 cm by 1 cm, which is ion-implanted with the isotope ⁷⁵ As at an approximate energy of 100 keV.

SRM 2134_cert

SRM 2134_SDS

應用

The SRM is used to calibrate the secondary ion response to detect the minor and trace levels of arsenic within a silicon matrix using the analytical technique of secondary ion mass spectrometry (SIMS).

特點和優勢

• Available with a certificate documenting NIST-certified value for retained dose of ⁷⁵As atoms and the dose is expressed in units of arsenic mass per unit area.
• The reference and information values of elements are reported as mass fraction.
• Certified values are retained dose of ⁷⁵As atoms, and the dose is expressed in units of arsenic mass per unit area.
• The NIST certificate is provided with expiration certificate, use, storage, handling, and maintenance instructions.

其他說明

Example analytes are listed below as a reference. Please download a current certificate at nist.gov/SRM for current analytes and certified values.
Arsenic (⁷⁵As)

See certificate for values and more details at nist.gov/SRM.

法律資訊

NIST is a registered trademark of National Institute of Standards and Technology

安全資訊

• 儲存類別代碼: 13 - Non Combustible Solids
• 水污染物質分類（WGK）: nwg
• 閃點（°F）: Not applicable
• 閃點（°C）: Not applicable