201073

三仲丁氧基铝

97%

• 同義詞: 仲丁醇铝
• 線性公式: Al[OCH(CH₃)C₂H₅]₃
• CAS號碼: 2269-22-9
• 分子量：: 246.32
• Beilstein: 3910908
• EC號碼: 218-871-2
• MDL號碼: MFCD00009327
• 分類程式碼代碼: 12352103
• PubChem物質ID: 24851994
• NACRES: NA.23

屬性

• 化驗: 97%
• 形狀: liquid
• 自燃溫度: 763 °F
• expl. lim.: 9.8 %
• 反應適用性: core: aluminum
• bp: 200-206 °C/30 mmHg (lit.)
• 密度: 0.967 g/mL at 25 °C (lit.)
• SMILES 字串: CCC(C)O[Al](OC(C)CC)OC(C)CC
• InChI: 1S/3C4H9O.Al/c3*1-3-4(2)5;/h3*4H,3H2,1-2H3;/q3*-1;+3
• InChI 密鑰: WOZZOSDBXABUFO-UHFFFAOYSA-N

描述

一般說明

Aluminum-tri-sec-butoxide is a metal organic chemical vapor deposition precursor and a chelating agent. It is widely used as a sol-gel precursor to deposit alumina thin films by atomic layer deposition method.

應用

Aluminum-tri-sec-butoxide can be used as a precursor :

• To prepare Al₂O₃-based quasi-solid electrolyte for Li metal anodes. This ensures long cycle lifetime and high constant current density.
• To synthesize nanospinel MgAl₂O₄ powder by a sol–gel method at low-temperature processing.
• To fabricate transparent superhydrophobic aluminum oxide thin films to prevent soiling of solar panels.
• To synthesize mesoporous alumina with large surface area to fabricate a functional interlayer for separator coating in a Li–S battery. It helps to suppress the shuttle effect and enhances cyclic stability andrateperformance.

特點和優勢

• Suitable for thin film deposition
• Solubility in various solvents allows for the facile preparation of solution-based precursors
• High thermal stability
• Facilitates the anchoring of catalytic metal nanoparticles onto substrates

已用于制备高表面积氧化铝，其中以 2,4-戊二酮（Aldrich 产品 P775-4）作为螯合剂。

安全資訊

• 象形圖: GHS02,GHS06
• 訊號詞: Danger
• 危險聲明: H226,H302,H311
• 防範說明: P210 - P233 - P240 - P280 - P301 + P312 - P303 + P361 + P353
• 危險分類: Acute Tox. 3 Dermal - Acute Tox. 4 Oral - Flam. Liq. 3
• 儲存類別代碼: 3 - Flammable liquids
• 水污染物質分類（WGK）: WGK 3
• 閃點（°F）: 78.8 °F - closed cup
• 閃點（°C）: 26 °C - closed cup
• 個人防護裝備: Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter