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Sigma-Aldrich

二乙基锌

packaged for use in deposition systems

别名:

DEZ, Zincdiethyl

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About This Item

线性分子式:
(C2H5)2Zn
CAS号:
557-20-0
分子量:
123.51
Beilstein:
3587207
EC號碼:
209-161-3
MDL號碼:
MFCD00009021
分類程式碼代碼:
12352300
PubChem物質ID:
24885000
NACRES:
NA.23

品質等級

100

形狀

liquid

折射率

n20/D 1.498 (lit.)

bp

117 °C (lit.)

mp

−28 °C (lit.)

密度

1.205 g/mL at 25 °C (lit.)

SMILES 字串

CC[Zn]CC

InChI

1S/2C2H5.Zn/c2*1-2;/h2*1H2,2H3;

InChI 密鑰

HQWPLXHWEZZGKY-UHFFFAOYSA-N

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相关类别

一般說明

Atomic number of base material: 30 Zinc

應用

Precursors Packaged for Depositions Systems
Reacted with water in a low temperature (<200°C) atomic layer deposition of polycrystalline ZnO layers displaying exciton photoluminescence at room temperature.

訊號詞

Danger

危險分類

Aquatic Acute 1 - Aquatic Chronic 1 - Eye Dam. 1 - Pyr. Liq. 1 - Skin Corr. 1B - Water-react 1

安全危害

EUH014

儲存類別代碼

4.2 - Pyrophoric and self-heating hazardous materials

水污染物質分類（WGK）

WGK 3

閃點（°F）

Not applicable

閃點（°C）

Not applicable

個人防護裝備

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter

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Journal of Applied Physics, 103, 033515-033515 (2008)
Vincent Coeffard et al.
Organic & biomolecular chemistry, 7(8), 1723-1734 (2009-04-04)
The straightforward preparation of new modular oxazoline-containing bifunctional catalysts is reported employing a microwave-assisted Buchwald-Hartwig aryl amination as the key step. Covalent attachment of 2-(o-aminophenyl)oxazolines and pyridine derivatives generated in good-to-high yields a series of ligands in two or three
Sang-Jin Jeon et al.
Journal of the American Chemical Society, 127(47), 16416-16425 (2005-11-25)
There is a great demand for development of catalyst systems that are not only efficient and highly enantioselective but are also environmentally benign. Herein we report investigations into the catalytic asymmetric addition of alkyl and functionalized alkyl groups to ketones
Donna K Friel et al.
Journal of the American Chemical Society, 130(30), 9942-9951 (2008-07-01)
Alkylations of pyridyl-substituted ynones with Et2Zn and Me2Zn, promoted by amino acid-based chiral ligands in the presence of Al-based alkoxides, afford tertiary propargyl alcohols efficiently in 57% to >98% ee. Two easily accessible chiral ligands are identified as optimal for
Lianbing Zhang et al.
Angewandte Chemie (International ed. in English), 48(27), 4982-4985 (2009-06-06)
New uses for ALD: By applying standard metal oxide atomic layer deposition (ALD) to two types of porphyrins, site-specific chemical infiltration of substrate molecules is achieved: Diethylzinc can diffuse into the interior of porphyrin supramolecular structures and induce metalation of
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