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Merck

669008

Sigma-Aldrich

四(二甲基胺基)钛(IV)

packaged for use in deposition systems

别名:

TDMAT, 四(二甲基氨基)钛(IV)

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About This Item

线性分子式:
[(CH3)2N]4Ti
CAS号:
分子量:
224.17
EC號碼:
MDL號碼:
分類程式碼代碼:
12352103
PubChem物質ID:
NACRES:
NA.23

化驗

99.999% (trace metals analysis)

形狀

liquid

反應適用性

core: titanium

bp

50 °C/0.5 mmHg (lit.)

密度

0.947 g/mL at 25 °C (lit.)

SMILES 字串

CN(C)[Ti](N(C)C)(N(C)C)N(C)C

InChI

1S/4C2H6N.Ti/c4*1-3-2;/h4*1-2H3;/q4*-1;+4

InChI 密鑰

MNWRORMXBIWXCI-UHFFFAOYSA-N

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一般說明

Atomic number of base material: 22 Titanium

應用

The product is a precursor for the deposition of titanium dioxide thin films by atomic layer deposition with water. Tetrakis(dimethylamido)titanium(IV) (TDMAT) undergoes exothermal reaction with excess cyclopentadiene to yield tris(dimethylamido)(η5-cyclopentadienyl)titanium(IV).

象形圖

FlameCorrosion

訊號詞

Danger

危險聲明

危險分類

Flam. Liq. 2 - Skin Corr. 1B - Water-react 1

安全危害

儲存類別代碼

4.3 - Hazardous materials which set free flammable gases upon contact with water

水污染物質分類(WGK)

WGK 3

閃點(°F)

-22.0 °F - closed cup

閃點(°C)

-30 °C - closed cup

個人防護裝備

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter


历史批次信息供参考:

分析证书(COA)

Lot/Batch Number

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其他客户在看

Mikami K, et al. et al.
Science of Synthesis: Houben-Weyl Methods of Molecular Transformations, 2, 494-494 (2014)
Journal of Applied Physics, 102, 083521/1-083521/1 (2007)
Matthew T McDowell et al.
ACS applied materials & interfaces, 7(28), 15189-15199 (2015-06-18)
Light absorbers with moderate band gaps (1-2 eV) are required for high-efficiency solar fuels devices, but most semiconducting photoanodes undergo photocorrosion or passivation in aqueous solution. Amorphous TiO2 deposited by atomic-layer deposition (ALD) onto various n-type semiconductors (Si, GaAs, GaP

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