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一般說明
三甲基铝主要用于聚乙烯和其它合成聚合物的工业生产,在生产中它是用作聚合反应的助催化剂。它也可作为前体用于合成无机铝化合物,包括氧化铝和各种沸石。
訊號詞
Danger
危險聲明
危險分類
Eye Dam. 1 - Pyr. Liq. 1 - Skin Corr. 1B - Water-react 1
安全危害
儲存類別代碼
4.2 - Pyrophoric and self-heating hazardous materials
水污染物質分類(WGK)
nwg
閃點(°F)
No data available
閃點(°C)
No data available
個人防護裝備
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
Pathology, 47(4), 302-307 (2015-05-06)
BRCA1-associated protein 1 (BAP1) is a tumour suppressor gene frequently inactivated in mesothelioma, rarely also in association with germline mutation. BAP1 mutations have been associated with improved prognosis and distinct clinicopathological features. We sought to determine the clinicopathological significance of
ACS nano, 9(6), 5884-5892 (2015-05-15)
Lithium metal is considered to be the most promising anode for next-generation batteries due to its high energy density of 3840 mAh g(-1). However, the extreme reactivity of the Li surface can induce parasitic reactions with solvents, contamination, and shuttled
Oncogene, 33(50), 5666-5674 (2013-12-03)
Castration-resistant prostate cancer (CRPC) continues to pose a significant clinical challenge with new generation second-line hormonal therapies affording limited improvement in disease outcome. As the androgen receptor (AR) remains a critical driver in CRPC, understanding the determinants of its transcriptional
The Journal of investigative dermatology, 135(5), 1358-1367 (2015-01-07)
Human cutaneous melanoma is a devastating skin cancer because of its invasive nature and high metastatic potential. We used tissue microarray to study the role of human eukaryotic translation initiation factor 4E (eIF4E) in melanoma progression in 448 melanocytic lesions
Oncogene, 34(16), 2103-2114 (2014-06-10)
Kinase suppressor of Ras-1 (KSR1) facilitates signal transduction in Ras-dependent cancers, including pancreatic and lung carcinomas but its role in breast cancer has not been well studied. Here, we demonstrate for the first time it functions as a tumor suppressor
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ALD — A Versatile Tool for Nanostructuring
近十年来出现了原子层沉积(ALD)技术以满足各种需求,包括半导体器件小型化、多孔结构上的保形沉积和纳米颗粒涂层。ALD基于两个相继的自限性表面反应。
Molecular Layer Deposition of Organic and Hybrid Organic-Inorganic Polymers
igma-Aldrich.com presents an article regarding the savannah ALD system - an excellent tool for atomic layer deposition.
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