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Merck
모든 사진(2)

주요 문서

484016

Sigma-Aldrich

Potassium hydroxide

reagent grade, 90%, flakes

동의어(들):

Caustic potash

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About This Item

Linear Formula:
KOH
CAS Number:
Molecular Weight:
56.11
EC Number:
MDL number:
UNSPSC 코드:
12352106
eCl@ss:
38100303
PubChem Substance ID:
NACRES:
NA.21
solubility:
water: soluble 1120 g/L

Grade

reagent grade

Quality Level

Agency

suitable for EPA 1613
suitable for SM 5210

vapor pressure

1 mmHg ( 719 °C)

분석

90%

양식

flakes

pH

~13.5 (25 °C, 5.6 g/L)

mp

361 °C (lit.)

solubility

water: soluble 1120 g/L

SMILES string

[OH-].[K+]

InChI

1S/K.H2O/h;1H2/q+1;/p-1

InChI key

KWYUFKZDYYNOTN-UHFFFAOYSA-M

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일반 설명

Potassium hydroxide (KOH) is a hygroscopic, water soluble base synthesized by the electrolysis of potassium chloride solution. It is the raw material for the synthesis of many potassium compounds. KOH reacts with CO2 to form potassium carbonate. This property can be utilized to absorb CO2. It participates as catalyst in aldol condensation reactions. KOH anisotropic etching of silicon is used for the fabrication of sub-micron silicon nitride waveguides using conventional contact lithography. Pulverized KOH may be used for the preparation of chalcones.

애플리케이션

Potassium hydroxide (KOH) was used in the following processes:
  • Quantification of glutathione (GSH) and glutathione disulfide (GSSG) in biological samples by HPLC.
  • Preparation of buffer for use in the Investigation of seed fatty acid (FA) composition, protein, oil and sugar content.
  • Stable isotopic profiling study of Caenorhabditis elegans.
Potassium hydroxide may be employed as an etchant for the laser modified glass. In combination with tellurium powder, it mediates the quantitative pinacolization of aromatic carbonyl compounds.

픽토그램

CorrosionExclamation mark

신호어

Danger

유해 및 위험 성명서

Hazard Classifications

Acute Tox. 4 Oral - Eye Dam. 1 - Met. Corr. 1 - Skin Corr. 1A

Storage Class Code

8B - Non-combustible corrosive hazardous materials

WGK

WGK 1

Flash Point (°F)

Not applicable

Flash Point (°C)

Not applicable


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Journal of visualized experiments : JoVE, (48)(48), doi:10-doi:10 (2011-03-16)
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Optics express, 23(5), 6780-6786 (2015-04-04)
We demonstrate a novel technique to fabricate sub-micron silicon nitride waveguides using conventional contact lithography with MEMS-grade photomasks. Potassium hydroxide anisotropic etching of silicon facilitates line reduction and roughness smoothing and is key to the technique. The fabricated waveguides is

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