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Merck
모든 사진(1)

문서

920126

Sigma-Aldrich

R2R Monolayer large grain CVD graphene on silicon wafer

4 in diameter, avg. no. of layers, 1

동의어(들):

Roll-to-Roll graphene

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About This Item

실험식(Hill 표기법):
C
CAS Number:
Molecular Weight:
12.01

Quality Level

설명

Growth method: roll-to-roll CVD
Wafer: SiO2 (300nm) Si
Number of layer: Monolayer
Raman intensity 2D/G: ≥1.5

특징

avg. no. of layers 1

시트 저항성

280 Ω/sq ±10%

크기

110 μm × 110 μm ± 10% , grain size

표면 범위

surface coverage >98%

투과

>97%

반도체 특성

(mobility>3000 cm2/V·s) (Hall effect measurements)

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관련 카테고리

일반 설명

Roll-to-roll, high-quality, monolayer CVD graphene with large grain size (∼110μm2) on 4 inch silicon wafer.

애플리케이션

Our Roll-to-Roll CVD graphene products are true monolayer high quality graphene, fabricated inside a Cleanroom, heavily monitored and QC to assure high reproducibility.
The roll-to-roll process allows continuous, large scale graphene production.
This large grain size graphene product on silicon wafer is ready to use, helps you minimize process time, and increase success rate. This product with low sheet resistance would enable unmatched reproducibility and allow high performance for CVD graphene based FET, CVD graphene based sensors, and heterostructure based micro/nano electronics.

Application examples:
  • Ultrafast Transistor
  • Optical devices
  • Bio/Gas Sensor
  • Transparent Electrode
  • Flexible Display
  • Smart Coating
  • Thermal management

주의사항

Be cautious not to drop
Keep away from contamination, heat, dust and flame etc.

저장 및 안정성

Avoid direct sun light, avoid high temperature, avoid high humidity, and avoid dust.

법적 정보

Product of LG Electronics, R&D use only

Storage Class Code

11 - Combustible Solids

WGK

WGK 3


시험 성적서(COA)

제품의 로트/배치 번호를 입력하여 시험 성적서(COA)을 검색하십시오. 로트 및 배치 번호는 제품 라벨에 있는 ‘로트’ 또는 ‘배치’라는 용어 뒤에서 찾을 수 있습니다.

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문서 라이브러리 방문

Integrating graphene into semiconductor fabrication lines.
Daniel Neumaier et al.
Nature materials, 18(6), 525-529 (2019-05-23)
Bing Deng et al.
Advanced materials (Deerfield Beach, Fla.), 31(9), e1800996-e1800996 (2018-10-03)
Chemical vapor deposition (CVD) is considered to be an efficient method for fabricating large-area and high-quality graphene films due to its excellent controllability and scalability. Great efforts have been made to control the growth of graphene to achieve large domain

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