706493
(3-Aminopropyl)triethoxysilane
packaged for use in deposition systems, ≥98%
동의어(들):
3-Triethoxysilylpropylamine, APTES, APTS
About This Item
추천 제품
분석
≥98%
양식
liquid
bp
217 °C/760 mmHg (lit.)
density
0.946 g/mL at 25 °C (lit.)
SMILES string
CCO[Si](CCCN)(OCC)OCC
InChI
1S/C9H23NO3Si/c1-4-11-14(12-5-2,13-6-3)9-7-8-10/h4-10H2,1-3H3
InChI key
WYTZZXDRDKSJID-UHFFFAOYSA-N
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일반 설명
신호어
Danger
유해 및 위험 성명서
Hazard Classifications
Acute Tox. 4 Oral - Eye Dam. 1 - Skin Corr. 1B - Skin Sens. 1
Storage Class Code
8A - Combustible corrosive hazardous materials
WGK
WGK 1
Flash Point (°F)
199.4 °F - closed cup
Flash Point (°C)
93 °C - closed cup
개인 보호 장비
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
이미 열람한 고객
문서
igma-Aldrich.com presents an article regarding the savannah ALD system - an excellent tool for atomic layer deposition.
Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition
Silica is a very popular inorganic nanomaterial used in a wide range of applications including fillers for rubber, catalyst supports, separation media, carriers in food and agriculture, and abrasive/anticaking agents in cosmetics. It is also widely believed to be an important material for biomedical applications for following reasons.
High Purity Metalorganic Precursors for CPV Device Fabrication
자사의 과학자팀은 생명 과학, 재료 과학, 화학 합성, 크로마토그래피, 분석 및 기타 많은 영역을 포함한 모든 과학 분야에 경험이 있습니다..
고객지원팀으로 연락바랍니다.