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product name
R2R Monolayer large grain CVD graphene on silicon wafer, 4 in diameter, avg. no. of layers, 1
品質水準
詳細
Growth method: roll-to-roll CVD
Wafer: SiO2 (300nm) Si
Number of layer: Monolayer
Raman intensity 2D/G: ≥1.5
特徴
avg. no. of layers 1
シート抵抗
280 Ω/sq ±10%
サイズ
110 μm × 110 μm ± 10% , grain size
表面被覆率
surface coverage >98%
透過率
>97%
半導体特性
(mobility>3000 cm2/V·s) (Hall effect measurements)
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詳細
Roll-to-roll, high-quality, monolayer CVD graphene with large grain size (∼110μm2) on 4 inch silicon wafer.
アプリケーション
Our Roll-to-Roll CVD graphene products are true monolayer high quality graphene, fabricated inside a Cleanroom, heavily monitored and QC to assure high reproducibility.
The roll-to-roll process allows continuous, large scale graphene production.
This large grain size graphene product on silicon wafer is ready to use, helps you minimize process time, and increase success rate. This product with low sheet resistance would enable unmatched reproducibility and allow high performance for CVD graphene based FET, CVD graphene based sensors, and heterostructure based micro/nano electronics.
Application examples:
The roll-to-roll process allows continuous, large scale graphene production.
This large grain size graphene product on silicon wafer is ready to use, helps you minimize process time, and increase success rate. This product with low sheet resistance would enable unmatched reproducibility and allow high performance for CVD graphene based FET, CVD graphene based sensors, and heterostructure based micro/nano electronics.
Application examples:
- Ultrafast Transistor
- Optical devices
- Bio/Gas Sensor
- Transparent Electrode
- Flexible Display
- Smart Coating
- Thermal management
注意
Be cautious not to drop
Keep away from contamination, heat, dust and flame etc.
Keep away from contamination, heat, dust and flame etc.
保管および安定性
Avoid direct sun light, avoid high temperature, avoid high humidity, and avoid dust.
法的情報
Product of LG Electronics, R&D use only
保管分類コード
11 - Combustible Solids
WGK
WGK 3
適用法令
試験研究用途を考慮した関連法令を主に挙げております。化学物質以外については、一部の情報のみ提供しています。 製品を安全かつ合法的に使用することは、使用者の義務です。最新情報により修正される場合があります。WEBの反映には時間を要することがあるため、適宜SDSをご参照ください。
労働安全衛生法名称等を表示すべき危険物及び有害物
名称等を表示すべき危険物及び有害物
労働安全衛生法名称等を通知すべき危険物及び有害物
名称等を通知すべき危険物及び有害物
Jan Code
920126-BULK:
920126-1EA:
920126-VAR:
最新バージョンのいずれかを選択してください:
Integrating graphene into semiconductor fabrication lines.
Nature materials, 18(6), 525-529 (2019-05-23)
Advanced materials (Deerfield Beach, Fla.), 31(9), e1800996-e1800996 (2018-10-03)
Chemical vapor deposition (CVD) is considered to be an efficient method for fabricating large-area and high-quality graphene films due to its excellent controllability and scalability. Great efforts have been made to control the growth of graphene to achieve large domain
ライフサイエンス、有機合成、材料科学、クロマトグラフィー、分析など、あらゆる分野の研究に経験のあるメンバーがおります。.
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