推荐产品
等級
analytical standard
品質等級
化驗
≥99.0% (GC)
技術
HPLC: suitable
gas chromatography (GC): suitable
mp
81-84 °C
應用
cleaning products
cosmetics
environmental
food and beverages
personal care
格式
neat
SMILES 字串
COc1ccc(cc1)C(=O)CC(=O)c2ccc(cc2)C(C)(C)C
InChI
1S/C20H22O3/c1-20(2,3)16-9-5-14(6-10-16)18(21)13-19(22)15-7-11-17(23-4)12-8-15/h5-12H,13H2,1-4H3
InChI 密鑰
XNEFYCZVKIDDMS-UHFFFAOYSA-N
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一般說明
阿伏苯宗是一种UVA过滤。用于防晒乳液和化妆品配方。它在约340-350 nm处具有最大吸收,在紫外线照射下吸收降低,导致UVA保护作用丧失。它的光稳定性非常敏感,因为它在极性质子溶剂中稳定,而在非极性溶剂中对光不稳定。
應用
有关合适的仪器技术的更多信息,请参阅产品′的检验报告。想要获得更多支持,请联系技术服务部。
阿伏苯宗可用作以下分析物定量的分析参考标准品:
阿伏苯宗可用于研究衍生自4-叔丁基-4′-甲氧基二苯甲酰甲烷(BM-DBM)的封闭二酮形式的光物理特性,光敏活性。
- 使用带有二极管阵列检测器的反相高效液相色谱(RP-HPLC-DAD)的防晒制剂。
- 使用液相色谱-正电喷雾电离-串联质谱法(LC-ESI-MS/MS)在多反应监测模式(MRM)下分析淡水、盐水样品、大鼠血浆和皮肤层。
阿伏苯宗可用于研究衍生自4-叔丁基-4′-甲氧基二苯甲酰甲烷(BM-DBM)的封闭二酮形式的光物理特性,光敏活性。
危險聲明
防範說明
危險分類
Aquatic Chronic 4
儲存類別代碼
11 - Combustible Solids
水污染物質分類(WGK)
WGK 2
個人防護裝備
Eyeshields, Gloves
其他客户在看
A sensitive LC?ESI-MS/MS method for the quantification of avobenzone in rat plasma and skin layers: Application to a topical administration study
Journal of Chromatography. B, Biomedical Sciences and Applications, 1003, 41-46 (2015)
Journal of the American Academy of Dermatology, 58(5 Suppl 2), S133-S138 (2008-04-25)
The risks associated with cumulative or overexposure to ultraviolet (UV) radiation are now well identified. They involve both UVB (290-320 nm) and UVA (320-400 nm) components. UVB radiation is still considered to be the major factor responsible for most harmful
Pharmaceutical research, 29(2), 559-573 (2011-09-23)
To prepare polyamide nanocapsules for skin photo-protection, encapsulating α-tocopherol, Parsol®MCX (ethylhexyl methoxycinnamate) and/or Parsol®1789 (butyl methoxydibenzoylmethane). Nanocapsules were obtained by combining spontaneous emulsification and interfacial polycondensation reaction between sebacoyl chloride and diethylenetriamine. Nano-emulsions used as control were obtained by the
International journal of dermatology, 47 Suppl 1, 35-37 (2008-11-15)
Over the last decade, a change in the public awareness regarding the possible danger of excessive sunlight exposure has resulted in an increased consumption of sunscreens. These products contain a broad spectrum of putative sensitizers that can cause contact dermatitis
Photochemistry and photobiology, 85(1), 178-184 (2008-08-05)
Novel sunscreens are required providing active protection in the UVA and UVB regions. On the other hand, there is an increasing concern about the photosafety of UV filters, as some of them are not sufficiently photostable. Avobenzone is one of
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