跳转至内容
Merck
所有图片(2)

文件

09649

Sigma-Aldrich

5-苯甲酰基-4-羟基-2-甲氧基苯

≥97.0% (HPLC)

别名:

HMBS, 舒利苯酮

登录查看公司和协议定价
所有图片(2)

About This Item

经验公式（希尔记法）:
C14H12O6S
CAS号:
4065-45-6
分子量:
308.31
Beilstein:
2889165
EC號碼:
223-772-2
MDL號碼:
MFCD00024962
分類程式碼代碼:
12352100
PubChem物質ID:
329748781
NACRES:
NA.22

化驗

≥97.0% (HPLC)

形狀

powder

雜質

≤10% water

SMILES 字串

COc1cc(O)c(cc1S(O)(=O)=O)C(=O)c2ccccc2

InChI

1S/C14H12O6S/c1-20-12-8-11(15)10(7-13(12)21(17,18)19)14(16)9-5-3-2-4-6-9/h2-8,15H,1H3,(H,17,18,19)

InChI 密鑰

CXVGEDCSTKKODG-UHFFFAOYSA-N

正在寻找类似产品? 访问 产品对比指南

相关类别

象形圖

Exclamation mark
GHS07

訊號詞

Warning

危險聲明

H315,H319,H412

危險分類

Aquatic Chronic 3 - Eye Irrit. 2 - Skin Irrit. 2

儲存類別代碼

11 - Combustible Solids

水污染物質分類（WGK）

WGK 1

閃點（°F）

No data available

閃點（°C）

No data available

個人防護裝備

dust mask type N95 (US), Eyeshields, Gloves

Choose from one of the most recent versions:

分析证书(COA)

Lot/Batch Number
BGBC3867V
BGBC0758V
BCBH4216V
BCBF2355V
BCBC9462V

Don't see the Right Version?

If you require a particular version, you can look up a specific certificate by the Lot or Batch number.

Search for a COA

已有该产品？

在文件库中查找您最近购买产品的文档。

访问文档库

S M Edwards et al.
Photodermatology, photoimmunology & photomedicine, 10(3), 111-117 (1994-06-01)
The ability to accurately predict the phototoxic potential of personal and skin care products remains a key element in assessing the safety of premarketed products. To find a reliable in vitro alternative test for photoirritancy, the European Commission and the
M Jarratt et al.
Journal of the American Academy of Dermatology, 9(3), 354-360 (1983-09-01)
A PABA ester-oxybenzone preparation is superior to PABA or sulisobenzone alone in protecting the skin from methoxsalen-induced ultraviolet A (UVA) phototoxicity after water substantivity challenge. Such a mixture would be useful as a UVA screen for uninvolved or actinically damaged
C Augustin et al.
Photodermatology, photoimmunology & photomedicine, 13(1-2), 27-36 (1997-02-01)
Phototoxicity inducing in vivo photoirritation, a reversible inflammatory reaction of the skin after chemical contact and UVA radiation exposure, is increasingly observed as a side effect associated with the use of both cosmetics and systemic drugs. In order to systematically
Zacarías León et al.
Analytica chimica acta, 664(2), 178-184 (2010-04-07)
2-Hydroxy-4-methoxybenzophenone and 2-hydroxy-4-methoxybenzophenone-5-sulphonic acid, commonly known as benzophenone-3 (BZ3) and benzophenone-4 (BZ4), respectively, are substances widely used as UV filters in cosmetic products in order to absorb UV radiation and protect human skin from direct exposure to the deleterious wavelengths
N Negreira et al.
Analytica chimica acta, 743, 101-110 (2012-08-14)
The stability of the UV filter benzophenone-4 (BP-4) in free chlorine-containing water was investigated, for the first time, by liquid chromatography quadrupole time-of-flight mass spectrometry (LC-QqTOF-MS). High mass accuracy and resolution capabilities of this hybrid mass spectrometer were used for
查看所有相关文献

我们的科学家团队拥有各种研究领域经验，包括生命科学、材料科学、化学合成、色谱、分析及许多其他领域.

联系技术服务部门