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等級
ACS reagent
品質等級
化驗
≥99.99% trace metals basis
形狀
crystalline
雜質
≤0.01% insolubles
<100 ppm total metallic impurities
負離子痕跡
chloride (Cl-): ≤0.002%
sulfate (SO42-): ≤0.01%
正離子痕跡
Ca: ≤0.005%
Fe: ≤0.005%
K: ≤0.005%
Na: ≤0.01%
Ni: ≤0.01%
Pb: ≤0.001%
應用
battery manufacturing
SMILES 字串
O.O.O.O.O.[Cu++].[Cu++].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O
InChI
1S/2Cu.4NO3.5H2O/c;;4*2-1(3)4;;;;;/h;;;;;;5*1H2/q2*+2;4*-1;;;;;
InChI 密鑰
IZDJJEMZQZQQQQ-UHFFFAOYSA-N
應用
訊號詞
Danger
危險分類
Acute Tox. 4 Oral - Aquatic Acute 1 - Aquatic Chronic 1 - Eye Dam. 1 - Met. Corr. 1 - Ox. Sol. 1 - Skin Corr. 1B
儲存類別代碼
5.1A - Strongly oxidizing hazardous materials
水污染物質分類(WGK)
WGK 3
閃點(°F)
Not applicable
閃點(°C)
Not applicable
個人防護裝備
dust mask type N95 (US), Eyeshields, Gloves
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商品
Advances in materials have often been led by the development of new synthetic methods that provide control over size, morphology and structure.
Advances in materials have often been led by the development of new synthetic methods that provide control over size, morphology and structure. The preparation of materials in a scalable and continuous manner is critical when development moves beyond lab-scale quantities.
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