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715166

Sigma-Aldrich

Octadecylphosphonic acid

97%

Sinonimo/i:

n-Octadecylphosphonic acid, ODPA

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About This Item

Formula empirica (notazione di Hill):
C18H39O3P
Numero CAS:
4724-47-4
Peso molecolare:
334.47
Numero MDL:
MFCD00015838
Codice UNSPSC:
12352300
ID PubChem:
329762947
NACRES:
NA.23

Saggio

97%

Forma fisica

crystals

Punto di fusione

95-100 °C

Stringa SMILE

CCCCCCCCCCCCCCCCCCP(O)(O)=O

InChI

1S/C18H39O3P/c1-2-3-4-5-6-7-8-9-10-11-12-13-14-15-16-17-18-22(19,20)21/h2-18H2,1H3,(H2,19,20,21)
FTMKAMVLFVRZQX-UHFFFAOYSA-N

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Descrizione generale

Octadecylphosphonic acid (OPA) is used as a self-assembled monolayer that forms a surfactant which strongly bonds with the surface atoms of different metal oxides. It provides hydrophobic properties and covers a higher surface area than the predominantly used silanes.

Applicazioni

Anti-corrosive coatings on cupronickel (CuNi) can be formed by fabricating a protective film of OPA by dip coating method. OPA may be used in the preparation of indium oxide(In2O3) nanowire transistor than can find potential application in the growth of fast switching and low noise nano-electronic devices. It may be used for self-cleaning and oil/water separation based applications as it forms a superhydrophobic layer on the copper mesh.

Pittogrammi

Exclamation mark
GHS07

Avvertenze

Warning

Indicazioni di pericolo

H315,H319

Classi di pericolo

Eye Irrit. 2 - Skin Irrit. 2

Codice della classe di stoccaggio

11 - Combustible Solids

Classe di pericolosità dell'acqua (WGK)

WGK 3

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Certificati d'analisi (COA)

Lot/Batch Number
BGBC2431V
BGBC1995V
BGBB8602
MKBJ8197V
MKBG5276V

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Fabrication of controllable and stable In2O3 nanowire transistors using an octadecylphosphonic acid self-assembled monolayer.
Lim T, et al.
Nanotechnology, 26(14), 145203-145203 (2015)
Modification of cupronickel alloy surface with octadecylphosphonic acid self-assembled films for improved corrosion resistance.
Mioc K, et al.
Corrosion Science, 134(10), 189-198 (2018)
Getachew Tizazu et al.
Langmuir : the ACS journal of surfaces and colloids, 25(18), 10746-10753 (2009-07-18)
Electron-hole pair formation at titania surfaces leads to the formation of reactive species that degrade organic materials. Here, we describe the degradation of self-assembled monolayers of alkylphosphonic acids on the native oxide of titanium following exposure to UV light. The
n-Octadecylphosphonic acid grafted mesoporous magnetic nanoparticle: Preparation, characterization, and application in magnetic solid-phase extraction.
Ding J, et al.
Journal of Chromatography A, 1217(47), 7351-7358 (2010)
Fast formation of superhydrophobic octadecylphosphonic acid (ODPA) coating for self-cleaning and oil/water separation.
Dai C, et al.
Soft Matter, 10(40), 8116-8121 (2014)
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