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Documentos Principais

749052

Sigma-Aldrich

Chromium

sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.95% trace metals basis

Sinônimo(s):

Chromium element

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About This Item

Fórmula empírica (Notação de Hill):
Cr
Número CAS:
Peso molecular:
52.00
Número CE:
Número MDL:
Código UNSPSC:
12352103
ID de substância PubChem:
NACRES:
NA.23

Ensaio

99.95% trace metals basis

forma

solid

adequação da reação

core: chromium

resistividade

12.7 μΩ-cm, 20°C

diâmetro × espessura

3.00 in. × 0.125 in.

pb

2672 °C (lit.)

pf

1857 °C (lit.)

densidade

7.14 g/mL at 25 °C (lit.)

cadeia de caracteres SMILES

[Cr]

InChI

1S/Cr

chave InChI

VYZAMTAEIAYCRO-UHFFFAOYSA-N

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Aplicação

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques.

Código de classe de armazenamento

11 - Combustible Solids

Classe de risco de água (WGK)

nwg

Ponto de fulgor (°F)

Not applicable

Ponto de fulgor (°C)

Not applicable


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