Direkt zum Inhalt
Merck
Alle Fotos(2)

Key Documents

View All Documentation

688509

Sigma-Aldrich

Siliziumtetrachlorid

packaged for use in deposition systems

Synonym(e):

STC, Tetrachlorsilan

Anmeldenzur Ansicht organisationsspezifischer und vertraglich vereinbarter Preise
Alle Fotos(2)

About This Item

Lineare Formel:
SiCl4
CAS-Nummer:
10026-04-7
Molekulargewicht:
169.90
MDL-Nummer:
MFCD00011229
UNSPSC-Code:
12352103
PubChem Substanz-ID:
329761169
NACRES:
NA.23

Dampfdichte

5.86 (vs air)

Dampfdruck

420 mmHg ( 37.7 °C)

Assay

99.998% trace metals basis

Form

liquid

Eignung der Reaktion

core: silicon

bp

57.6 °C (lit.)

mp (Schmelzpunkt)

−70 °C (lit.)

Dichte

1.483 g/mL at 25 °C (lit.)

SMILES String

Cl[Si](Cl)(Cl)Cl

InChI

1S/Cl4Si/c1-5(2,3)4

InChIKey

FDNAPBUWERUEDA-UHFFFAOYSA-N

Suchen Sie nach ähnlichen Produkten? Aufrufen Leitfaden zum Produktvergleich

Allgemeine Beschreibung

Atomic number of base material: 14 Silicon

Anwendung

Precursors Packaged for Depositions Systems

Piktogramme

Skull and crossbonesCorrosion
GHS06,GHS05

Signalwort

Danger

Gefahreneinstufungen

Acute Tox. 3 Inhalation - Acute Tox. 3 Oral - Eye Dam. 1 - Skin Corr. 1A - STOT SE 3

Zielorgane

Respiratory system

Zusätzliche Gefahrenhinweise

EUH014,EUH071

Lagerklassenschlüssel

6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects

WGK

WGK 1

Flammpunkt (°F)

Not applicable

Flammpunkt (°C)

Not applicable

Persönliche Schutzausrüstung

Faceshields, Gloves, Goggles

Hier finden Sie alle aktuellen Versionen:

Analysenzertifikate (COA)

Lot/Batch Number
SHBM7565
SHBK6266
SHBF7138V
06618LH

Die passende Version wird nicht angezeigt?

Wenn Sie eine bestimmte Version benötigen, können Sie anhand der Lot- oder Chargennummer nach einem spezifischen Zertifikat suchen.

Suche nach COA

Besitzen Sie dieses Produkt bereits?

In der Dokumentenbibliothek finden Sie die Dokumentation zu den Produkten, die Sie kürzlich erworben haben.

Die Dokumentenbibliothek aufrufen

Kunden haben sich ebenfalls angesehen

Slide 1 of 3

1 of 3

Tetraethylorthosilicat packaged for use in deposition systems

Sigma-Aldrich

759414

Tetraethylorthosilicat

2-Methyltetrahydrofuran analytical standard

Supelco

85488

2-Methyltetrahydrofuran

Tetrakis(dimethylamido)titan(IV) packaged for use in deposition systems

Sigma-Aldrich

669008

Tetrakis(dimethylamido)titan(IV)

J R Piascik et al.
Dental materials : official publication of the Academy of Dental Materials, 25(9), 1116-1121 (2009-04-21)
The overall goal of this research was to develop a practical method to chemically modify the surface of high strength dental ceramics (i.e. zirconia) to facilitate viable, robust adhesive bonding using commercially available silanes and resin cements. Investigation focused on
Sherif Zein El Abedin et al.
Accounts of chemical research, 40(11), 1106-1113 (2007-05-25)
Due to their wide thermal windows, ionic liquids can be regarded as the missing link between aqueous/organic solutions and high-temperature molten salts. They can be employed efficiently for the coating of other metals with thin layers of tantalum, aluminum, and
Roman A Sandler et al.
Journal of vision, 15(9), 16-16 (2015-08-01)
Receptive field identification is a vital problem in sensory neurophysiology and vision. Much research has been done in identifying the receptive fields of nonlinear neurons whose firing rate is determined by the nonlinear interactions of a small number of linear
C Schulze Isfort et al.
Toxicology letters, 186(3), 148-151 (2008-12-31)
Synthetic nanoscaled metal oxides are mainly produced by pyrogenic decomposition of precursors in the gas phase using a hot-wall or plasma reactor. Due to their low production rate and limited scalability, these processes are of minor technical relevance in manufacturing
Baker Jawabrah Al-Hourani et al.
Bioorganic & medicinal chemistry letters, 22(6), 2235-2238 (2012-02-22)
A series of novel 5-substituted 1H-tetrazoles as cyclooxygenase-2 (COX-2) inhibitors was prepared via treatment of various diaryl amides with tetrachlorosilane/sodium azide. All compounds were tested in cyclooxygenase (COX) assays in vitro to determine COX-1 and COX-2 inhibitory potency and selectivity.
Alle zugehörigen Dokumente anzeigen

Artikel

The Savannah ALD System - An Excellent Tool for Atomic Layer Deposition

igma-Aldrich.com presents an article regarding the savannah ALD system - an excellent tool for atomic layer deposition.

Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition

Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition

Silicon Nitride Atomic Layer Deposition: A Brief Review of Precursor Chemistry

atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer

Recent Progress in Spintronic Materials

Spin-based electronic (spintronic) devices offer significant improvement to the limits of conventional charge-based memory and logic devices which suffer from high power usage, leakage current, performance saturation, and device complexity.

Alle anzeigen

Unser Team von Wissenschaftlern verfügt über Erfahrung in allen Forschungsbereichen einschließlich Life Science, Materialwissenschaften, chemischer Synthese, Chromatographie, Analytik und vielen mehr..

Setzen Sie sich mit dem technischen Dienst in Verbindung.