Direkt zum Inhalt
Merck
Alle Fotos(1)

Key Documents

View All Documentation

523771

Sigma-Aldrich

Tetramethylsilan

electronic grade, ≥99.99% trace metals basis

Anmeldenzur Ansicht organisationsspezifischer und vertraglich vereinbarter Preise
Alle Fotos(1)

About This Item

Lineare Formel:
Si(CH3)4
CAS-Nummer:
75-76-3
Molekulargewicht:
88.22
Beilstein:
1696908
EG-Nummer:
200-899-1
MDL-Nummer:
MFCD00008274
UNSPSC-Code:
12352103
PubChem Substanz-ID:
24874369
NACRES:
NA.23

Qualität

electronic grade

Dampfdruck

11.66 psi ( 20 °C)

Assay

≥99.99% trace metals basis

Form

liquid

Selbstzündungstemp.

842 °F

Brechungsindex

n20/D 1.358 (lit.)

bp

26-28 °C (lit.)

mp (Schmelzpunkt)

−99 °C (lit.)

Dichte

0.648 g/mL at 25 °C (lit.)

Lagertemp.

2-8°C

SMILES String

C[Si](C)(C)C

InChI

1S/C4H12Si/c1-5(2,3)4/h1-4H3

InChIKey

CZDYPVPMEAXLPK-UHFFFAOYSA-N

Suchen Sie nach ähnlichen Produkten? Aufrufen Leitfaden zum Produktvergleich

Allgemeine Beschreibung

Atomic number of base material: 14 Silicon

Piktogramme

Flame
GHS02

Signalwort

Danger

H-Sätze

H224

P-Sätze

P210

Gefahreneinstufungen

Flam. Liq. 1

Lagerklassenschlüssel

3 - Flammable liquids

WGK

WGK 3

Flammpunkt (°F)

-16.6 °F - closed cup

Flammpunkt (°C)

-27 °C - closed cup

Persönliche Schutzausrüstung

Eyeshields, Faceshields, Gloves

Hier finden Sie alle aktuellen Versionen:

Analysenzertifikate (COA)

Lot/Batch Number
SHBJ5809
SHBH0010V
SHBF7771V
SHBD5584V
SHBC3586V

Die passende Version wird nicht angezeigt?

Wenn Sie eine bestimmte Version benötigen, können Sie anhand der Lot- oder Chargennummer nach einem spezifischen Zertifikat suchen.

Suche nach COA

Besitzen Sie dieses Produkt bereits?

In der Dokumentenbibliothek finden Sie die Dokumentation zu den Produkten, die Sie kürzlich erworben haben.

Die Dokumentenbibliothek aufrufen

Kunden haben sich ebenfalls angesehen

Slide 1 of 3

1 of 3

(3-Aminopropyl)triethoxysilan ≥98.0%

Sigma-Aldrich

741442

(3-Aminopropyl)triethoxysilan

(3-Aminopropyl)triethoxysilan 99%

Sigma-Aldrich

440140

(3-Aminopropyl)triethoxysilan

Tetraethylorthosilikat reagent grade, 98%

Sigma-Aldrich

131903

Tetraethylorthosilikat

Ramesh C Sharma et al.
Spectrochimica acta. Part A, Molecular and biomolecular spectroscopy, 65(3-4), 787-791 (2006-03-15)
The decomposition of trimethylsilane and tetramethylsilane has been investigated for the first time, using hot wire (catalytic) at various temperatures. Trimethylsilane is catalytic-dissociated in these species SiH(2), CH(3)SiH, CH(3), CH(2)Si. Time of flight mass spectroscopy signal of these species are
Roy E Hoffman
Journal of magnetic resonance (San Diego, Calif. : 1997), 163(2), 325-331 (2003-08-14)
The chemical shift of TMS is commonly assumed to be zero. However, it varies by over 1 ppm for 1H and 4 ppm for 13C and shows a correlation with the physical properties of the solvent. Using the commonly accepted
Maria T Proetto et al.
ChemMedChem, 9(6), 1176-1187 (2014-05-23)
A series of methoxy- and fluorine-substituted [salophene]platinum(II) complexes (salophene=N,N'-bis(salicylidene)-1,2-phenylenediamine) were synthesized and characterized by (1) H NMR spectroscopy and mass spectrometry. The structure was confirmed on the example of [5-OCH3 -salophene]platinum(II) (4-Pt) by crystal structure analysis. The cytotoxicity of all
Jose C Pichardo et al.
Journal of nuclear medicine : official publication, Society of Nuclear Medicine, 52(9), 1482-1489 (2011-07-30)
The current gold standard for measuring marrow cellularity is the bone marrow (BM) biopsy of the iliac crest. This measure is not predictive of total marrow cellularity, because the biopsy volume is typically small and fat fraction varies across the
August Andersson et al.
FEBS letters, 545(2-3), 139-143 (2003-06-14)
The interaction between the peptide hormone motilin and bicelles has been investigated by pulsed field gradient-nuclear magnetic resonance methods and by the use of paramagnetic probes. Diffusion coefficients were measured for motilin, the phospholipids with and without motilin, and for
Alle zugehörigen Dokumente anzeigen

Artikel

Silicon Nitride Atomic Layer Deposition: A Brief Review of Precursor Chemistry

atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer

FePt Nanogranular films for high density heat-assisted magnetic recording

A hard disk drive (HDD) is a data storage device that stores digital information by magnetizing nanosized magnets on flat disks and retrieves data by sensing the resulting magnetic field.

Recent Progress in Spintronic Materials

Spin-based electronic (spintronic) devices offer significant improvement to the limits of conventional charge-based memory and logic devices which suffer from high power usage, leakage current, performance saturation, and device complexity.

High Purity Metalorganic Precursors for CPV Device Fabrication

High Purity Metalorganic Precursors for CPV Device Fabrication

Alle anzeigen

Unser Team von Wissenschaftlern verfügt über Erfahrung in allen Forschungsbereichen einschließlich Life Science, Materialwissenschaften, chemischer Synthese, Chromatographie, Analytik und vielen mehr..

Setzen Sie sich mit dem technischen Dienst in Verbindung.