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MilliporeSigma

774022

Sigma-Aldrich

Yttrium(III) oxide

sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.99% trace metals basis

Sinónimos:

Yttria

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About This Item

Fórmula lineal:
Y2O3
Número de CAS:
Peso molecular:
225.81
EC Number:
MDL number:
UNSPSC Code:
12352302
PubChem Substance ID:
NACRES:
NA.23

assay

99.99% trace metals basis

form

powder

reaction suitability

core: yttrium

diam. × thickness

2.00 in. × 0.25 in.

mp

2410 °C (lit.)

density

5.01 g/mL at 25 °C (lit.)

SMILES string

O=[Y]O[Y]=O

InChI

1S/3O.2Y

InChI key

SIWVEOZUMHYXCS-UHFFFAOYSA-N

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Application

Solid Oxide Fuel cells operating at temperatures below 800 C (also known as intermediate temperature solid oxide fuel cell, IT-SOFC) are currently the topic of much research and development owing to the high degradation rates and materials costs incurred for SOFC operating at temperatures above 900 C. Thin films of electrode and electrolyte layers is one of the ways to achieve high performances in IT-SOFC.
Yttrium oxide sputtering target can be used for physical vapor deposition of thin films of yttria stabilized zirconia layers for IT-SOFC. Yttrium containing films are used as thermal barrier and protective coatings in thermoelectric devices, rare earth doped yttrium oxide films are studied for phosphor applications.

Storage Class

13 - Non Combustible Solids

wgk_germany

WGK 1

flash_point_f

Not applicable

flash_point_c

Not applicable


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