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767506

Sigma-Aldrich

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sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.995% trace metals basis

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About This Item

經驗公式（希爾表示法）:
Ti
CAS號碼:
7440-32-6
分子量：:
47.87
EC號碼:
231-142-3
MDL號碼:
MFCD00011264
分類程式碼代碼:
12352103
PubChem物質ID:
329767320
NACRES:
NA.23

化驗

99.995% trace metals basis

形狀

solid

自燃溫度

860 °F

反應適用性

core: titanium

電阻係數

42.0 μΩ-cm, 20°C

直徑× 厚度

2.00 in. × 0.25 in.

bp

3287 °C (lit.)

mp

1660 °C (lit.)

密度

4.5 g/mL at 25 °C (lit.)

SMILES 字串

[Ti]

InChI

1S/Ti

InChI 密鑰

RTAQQCXQSZGOHL-UHFFFAOYSA-N

應用

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition.

儲存類別代碼

11 - Combustible Solids

水污染物質分類（WGK）

nwg

閃點（°F）

Not applicable

閃點（°C）

Not applicable

分析證明 (COA)

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Kostantinidis, S.; et al.
The European Physical Journal - Applied Physics, 56, 24002/1-24002/1 (2011)
Helmersson; U.; et al.
Thin Solid Films, 513, 1-1 (2006)
A Kurbad et al.
International journal of computerized dentistry, 16(2), 125-141 (2013-08-13)
This article presents two novel options for lithium-disilicate restorations supported by single-tooth implants. By using a Ti-Base connector, hybrid abutments and hybrid abutment crowns can be fabricated for different implant systems. The latter option in particular is an interesting new
J H Kim et al.
Journal of nanoscience and nanotechnology, 13(7), 4601-4607 (2013-08-02)
Nanocytalline TiN films were deposited on non-alkali glass and Al substrates by reactive DC magnetron sputtering (DCMS) with an electromagnetic field system (EMF). The microstructure and corrosion resistance of the TiN-coated Al substrates were estimated by X-ray diffraction (XRD), scanning
Jinho Shin et al.
Journal of nanoscience and nanotechnology, 13(8), 5807-5810 (2013-07-26)
In this study, hydroxyapatite (HA) was coated on anodized titanium (Ti) surfaces through radio frequency magnetron sputtering in order to improve biological response of the titanium surface. All the samples were blasted with resorbable blasting media (RBM). RBM-blasted Ti surface
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