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669008

Sigma-Aldrich

四(二甲基胺基)钛(IV)

packaged for use in deposition systems

同義詞:

TDMAT, 四(二甲基氨基)钛(IV)

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About This Item

線性公式:
[(CH3)2N]4Ti
CAS號碼:
分子量::
224.17
EC號碼:
MDL號碼:
分類程式碼代碼:
12352103
PubChem物質ID:
NACRES:
NA.23

品質等級

化驗

99.999% (trace metals analysis)

形狀

liquid

反應適用性

core: titanium

bp

50 °C/0.5 mmHg (lit.)

密度

0.947 g/mL at 25 °C (lit.)

SMILES 字串

CN(C)[Ti](N(C)C)(N(C)C)N(C)C

InChI

1S/4C2H6N.Ti/c4*1-3-2;/h4*1-2H3;/q4*-1;+4

InChI 密鑰

MNWRORMXBIWXCI-UHFFFAOYSA-N

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一般說明

Atomic number of base material: 22 Titanium

應用

The product is a precursor for the deposition of titanium dioxide thin films by atomic layer deposition with water. Tetrakis(dimethylamido)titanium(IV) (TDMAT) undergoes exothermal reaction with excess cyclopentadiene to yield tris(dimethylamido)(η5-cyclopentadienyl)titanium(IV).

象形圖

FlameCorrosion

訊號詞

Danger

危險聲明

危險分類

Flam. Liq. 2 - Skin Corr. 1B - Water-react 1

安全危害

儲存類別代碼

4.3 - Hazardous materials which set free flammable gases upon contact with water

水污染物質分類(WGK)

WGK 3

閃點(°F)

-22.0 °F - closed cup

閃點(°C)

-30 °C - closed cup

個人防護裝備

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter


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分析證明 (COA)

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Mikami K, et al. et al.
Science of Synthesis: Houben-Weyl Methods of Molecular Transformations, 2, 494-494 (2014)
Journal of Applied Physics, 102, 083521/1-083521/1 (2007)
Matthew T McDowell et al.
ACS applied materials & interfaces, 7(28), 15189-15199 (2015-06-18)
Light absorbers with moderate band gaps (1-2 eV) are required for high-efficiency solar fuels devices, but most semiconducting photoanodes undergo photocorrosion or passivation in aqueous solution. Amorphous TiO2 deposited by atomic-layer deposition (ALD) onto various n-type semiconductors (Si, GaAs, GaP

文章

igma-Aldrich.com presents an article regarding the savannah ALD system - an excellent tool for atomic layer deposition.

Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition

Since the demonstration of the first practical solar cell 60 years ago, research on novel materials, improved solar cell design and structure, and innovative manufacturing processes have all contributed to a continuous increase in the efficiency of photovoltaic (PV) devices.

High Purity Metalorganic Precursors for CPV Device Fabrication

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