推薦產品
訊號詞
Danger
危險分類
Acute Tox. 4 Oral - Eye Dam. 1 - Flam. Liq. 3 - Skin Corr. 1B - STOT SE 3
標靶器官
Respiratory system
安全危害
儲存類別代碼
3 - Flammable liquids
水污染物質分類（WGK）
WGK 1
閃點（°F）
79.0 °F
閃點（°C）
26.1 °C
個人防護裝備
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
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David Gräfe et al.
Nature communications, 9(1), 2788-2788 (2018-07-19)
Existing photoresists for 3D laser lithography that can be removed after development in a subtractive manner typically suffer from harsh cleavage conditions. Here, we report chemoselectively cleavable photoresists for 3D laser lithography based on silane crosslinkers, allowing the targeted degradation
我們的科學家團隊在所有研究領域都有豐富的經驗，包括生命科學、材料科學、化學合成、色譜、分析等.
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